Detail
Description
Focussed
laser, direct-write optical lithography system.
Exposure wavelength 405nm
Maximum resolution 1um
Capable of patterning up to 6in wafer.
Linear-encoder controlled stage with sub 100nm positioning accuracy (better if using in-built interferometer control)
Multiple layer overlay alignment capability
Gain-split capability to enable variable exposure dose within exposure field.
Exposure wavelength 405nm
Maximum resolution 1um
Capable of patterning up to 6in wafer.
Linear-encoder controlled stage with sub 100nm positioning accuracy (better if using in-built interferometer control)
Multiple layer overlay alignment capability
Gain-split capability to enable variable exposure dose within exposure field.
Details
| Name | Microtech LW405 Laser writer |
|---|---|
| Manufacturers | Microtech |
Fingerprint
Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.