Microtech LW405B+ Laser writer

  • Kunal Lulla Ramrakhiyani (Senior Technical Specialist)

Facility/equipment: Equipment

Equipments Details


Focussed laser, direct-write optical lithography system.
Exposure wavelength 405nm, auxiliary 375nm laser available for thick resist exposure.
Maximum resolution 1um
Capable of patterning up to 6in wafer.
Linear-encoder controlled stage with sub 100nm positioning accuracy (better if using in-built interferometer control)
Multiple layer overlay alignment capability
Gain-split capability to enable variable exposure dose within exposure field.


NameMicrotech LW405B+ Laser writer


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