Details
Description
Focussed laser, direct-write optical lithography system.
Exposure wavelength: 405nm
Maximum resolution: 1μm
Capable of patterning up to 6" wafer.
Linear-encoder controlled stage with sub 100nm positioning accuracy (better if using in-built interferometer control)
Multiple layer overlay alignment capability
Gain-split capability to enable variable exposure dose within exposure field.
Exposure wavelength: 405nm
Maximum resolution: 1μm
Capable of patterning up to 6" wafer.
Linear-encoder controlled stage with sub 100nm positioning accuracy (better if using in-built interferometer control)
Multiple layer overlay alignment capability
Gain-split capability to enable variable exposure dose within exposure field.
Details
| Name | Microtech: LW405D Laser Writer |
|---|---|
| Manufacturers | Microtech |
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