Near-Ambient Pressure X-ray Photoemission Spectroscopy (NAP-XPS)

Facility/equipment: Facility

Equipments Details

Description

In X-ray photoemission spectroscopy (XPS), emitted photoelectrons carry information about the elements present in a sample and their original bonding environment. Critically, only electrons from the very surface of the sample escape and reach the detector - making XPS a surface-sensitive technique.

The SPECS NAP-XPS allows for XPS characterisation under more realistic conditions than a standard UHV system. This allows the materials to be studied during exposure to mbar pressures of pure gases (or mixtures), enabling greater understanding of surface chemistry and real-time monitoring of chemical reactions.

Key Specifications:
Monochromated Al Kα X-ray source (1486.7 eV)
Analysis of samples in UHV (10-9 mbar) or up to 25 mbar in specialist NAP cell.
Gases for NAP include: CO, CO2, NH3, H2, O2, and H2O. Other gases can be requested.
Localised heating within the NAP cell up to 500ºC (gas dependent)

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