Near-Ambient Pressure X-ray Photoemission Spectroscopy (NAP-XPS)

Facility/equipment: Facility

Equipments Details


In X-ray photoemission spectroscopy (XPS), emitted photoelectrons carry information about the elements present in a sample and their original bonding environment. Critically, only electrons from the very surface of the sample escape and reach the detector - making XPS a surface-sensitive technique.

The SPECS NAP-XPS allows for XPS characterisation under more realistic conditions than a standard UHV system. This allows the materials to be studied during exposure to mbar pressures of pure gases (or mixtures), enabling greater understanding of surface chemistry and real-time monitoring of chemical reactions.

Key Specifications:
Monochromated Al Kα X-ray source (1486.7 eV)
Analysis of samples in UHV (10-9 mbar) or up to 25 mbar in specialist NAP cell.
Gases for NAP include: CO, CO2, NH3, H2, O2, and H2O. Other gases can be requested.
Localised heating within the NAP cell up to 500ºC (gas dependent)


Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.