The Platform for Nanoscale Advanced Materials Engineering (or P-NAME) enables the electronic, optical and magnetic doping of advanced materials to provide localised control of functionality with sub-20nm precision. The tool has 2 beams: 1) a multi-ion liquid metal alloy ion source FIB for sample doping and patterning; 2) an electron beam for sample imaging and exposure (SEM).
Key capabilities:
– sub-5nm resolution e-beam imaging enabling the target for doping to be identified without ion contamination;
– isotopically-selected ion doping of species from liquid metal ion sources with sub- 20nm resolution;
– deterministic single ion to high dose (e.g. 1019 ions/cm2) doping at energies from ~5 to 75 keV (species dependent);
– 150mm (6-inch) sample handling with vacuum suitcase compatibility.
– in-situ electrical measurements possible
Isotopic species available Au, Ge, Sb, Nd, Cu, Co, B, Mn, Pt, P, In, Ni, Si, Pb, Sn, Bi, Er
Further sources available upon request
- QC Physics
- Q Science (General)
- QD Chemistry
- Quantum
- Focused Ion Beam
- Doping
- Advanced Materials
- Nanomaterials
- Photonics