PSI Optoelectronic Device Fabrication Facilities

"Lab 2.308 is a state-of-the-art facility at PSI dedicated to the fabrication, processing, and analysis of advanced optoelectronic devices. Designed to support research in materials science, nanotechnology, and organic electronics, the lab is equipped with a comprehensive suite of high-precision instruments and supports a wide range of thin-film deposition, thermal processing, and nanostructuring techniques.

Key Capabilities:
Thin-Film Deposition: Including sputtering (DC and RF), thermal evaporation, and spin coating inside and outside the glovebox.

Atmosphere-Sensitive Processing: Conducted within a nitrogen-filled MBRAUN glovebox suite equipped with integrated spin coaters and deposition tools.

Thermal Processing: Featuring a Rapid Thermal Annealer (up to 1300 °C) for precise post-deposition treatment.

Nanofabrication: Access to a NanoFrazor for direct-write high-resolution nanostructuring.

Laser Processing: An excimer laser system is available for advanced photonic and materials research applications."