Details
Description
Mask-based, 1X, optical lithography system.
500W Hg/Xe UDUV lamp with output down to 240nm (PMMA exposure capable)
Band-pass filters for 240-260nm, 280-350nm & 350-450nm available.
Multiple contact modes
Resolution down to 0.5μm possible
Maximum substrate size: 4" wafer
Twin-microscope, split-field overlay alignment
500W Hg/Xe UDUV lamp with output down to 240nm (PMMA exposure capable)
Band-pass filters for 240-260nm, 280-350nm & 350-450nm available.
Multiple contact modes
Resolution down to 0.5μm possible
Maximum substrate size: 4" wafer
Twin-microscope, split-field overlay alignment
Details
| Name | Süss Microtec: MJB4 Mask Aligner (Twin-Microscope) |
|---|---|
| Manufacturers | Süss Microtec |
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