Richard Winpenny

Filter

2018
Design and implementation of the next generation electron beam resists for the production of EUVL photomasks
Lewis, S. M., DeRose, G. A., Alty, H. R., Hunt, M. S., Li, J., Werthiem, A., Fowler, T., Lee, S. K., Muryn, C. A., Timco, G. A., Scherer, A., Yeates, S. G. & Winpenny, R. E. P., 2018, Photomask Technology 2018. Gallagher, E. E. & Rankin, J. H. (eds.). SPIE, 108100N. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 10810).
Research output: Chapter in Book/Conference proceeding › Conference contribution › peer-review

Research output