A comparative study of near-UV emitting InGaN quantum wells with AlGaN and AlInGaN barriers

D. Zhu, M. J. Kappers, P. M F J Costa, C. McAleese, F. D G Rayment, G. R. Chabrol, D. M. Graham, P. Dawson, E. J. Thrush, J. T. Mullins, C. J. Humphreys

    Research output: Contribution to journalArticlepeer-review

    Abstract

    InGaN multiple quantum well (MQW) structures with AlGaN and AlInGaN barriers were grown on sapphire by metalorganic vapour phase epitaxy (MOVPE). The high resolution X-ray diffraction (HRXRD) and transmission electron microscopy (TEM) characterisation results show substantial improvements in the material quality by introducing a small amount of indium into the AlGaN barriers, resulting in improved optical properties, as indicated by low-temperature (6 K) photoluminescence (LT-PL) spectroscopy. © 2006 WILEY-VCH Verlag GmbH & Co. KGaA.
    Original languageEnglish
    Pages (from-to)1819-1823
    Number of pages4
    JournalPhysica Status Solidi (A) Applications and Materials Science
    Volume203
    Issue number7
    DOIs
    Publication statusPublished - May 2006

    Fingerprint

    Dive into the research topics of 'A comparative study of near-UV emitting InGaN quantum wells with AlGaN and AlInGaN barriers'. Together they form a unique fingerprint.

    Cite this