A far-infrared RAIRS investigation of SnCl4 on a silica surface using the buried metal layer approach

M. J. Pilling; P. Gardner; M. E. Penible; M. Surman

A far-infrared RAIRS investigation of SnCl4 on a silica surface using the buried metal layer approach

M. J. Pilling, P. Gardner, M. E. Penible, M. Surman

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Abstract

Far-infra red RAIRS spectroscopy employing synchrotron radiation as a source, has been used to study the interaction of SnCl4 on a thin-film silica surface. This has been made possible by growing the silica film on a highly reflecting tungsten substrate, enabling the conventional RAIRS geometry to be used. We show that reasonable S/N RAIRS spectra can be obtained in this region, even from films up to 1000 Å thick, enabling subtle details in the spectrum of the chemisorbed species to be obtained. © 1998 Elsevier Science B.V. All rights reserved.

Original language	English
Pages (from-to)	-L7
Journal	Surface Science
Volume	418
Issue number	1
Publication status	Published - 27 Nov 1998

Keywords

Chemical vapour deposition
Chemisorption
Glass surfaces
Infra-red absorption spectroscopy
Reflection spectroscopy
Silicon oxide
SnCl4
Tin oxides

Cite this

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title = "A far-infrared RAIRS investigation of SnCl4 on a silica surface using the buried metal layer approach",

abstract = "Far-infra red RAIRS spectroscopy employing synchrotron radiation as a source, has been used to study the interaction of SnCl4 on a thin-film silica surface. This has been made possible by growing the silica film on a highly reflecting tungsten substrate, enabling the conventional RAIRS geometry to be used. We show that reasonable S/N RAIRS spectra can be obtained in this region, even from films up to 1000 {\AA} thick, enabling subtle details in the spectrum of the chemisorbed species to be obtained. {\textcopyright} 1998 Elsevier Science B.V. All rights reserved.",

keywords = "Chemical vapour deposition, Chemisorption, Glass surfaces, Infra-red absorption spectroscopy, Reflection spectroscopy, Silicon oxide, SnCl4, Tin oxides",

author = "Pilling, {M. J.} and P. Gardner and Penible, {M. E.} and M. Surman",

year = "1998",

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language = "English",

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journal = "Surface Science",

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T1 - A far-infrared RAIRS investigation of SnCl4 on a silica surface using the buried metal layer approach

AU - Pilling, M. J.

AU - Gardner, P.

AU - Penible, M. E.

AU - Surman, M.

PY - 1998/11/27

Y1 - 1998/11/27

N2 - Far-infra red RAIRS spectroscopy employing synchrotron radiation as a source, has been used to study the interaction of SnCl4 on a thin-film silica surface. This has been made possible by growing the silica film on a highly reflecting tungsten substrate, enabling the conventional RAIRS geometry to be used. We show that reasonable S/N RAIRS spectra can be obtained in this region, even from films up to 1000 Å thick, enabling subtle details in the spectrum of the chemisorbed species to be obtained. © 1998 Elsevier Science B.V. All rights reserved.

AB - Far-infra red RAIRS spectroscopy employing synchrotron radiation as a source, has been used to study the interaction of SnCl4 on a thin-film silica surface. This has been made possible by growing the silica film on a highly reflecting tungsten substrate, enabling the conventional RAIRS geometry to be used. We show that reasonable S/N RAIRS spectra can be obtained in this region, even from films up to 1000 Å thick, enabling subtle details in the spectrum of the chemisorbed species to be obtained. © 1998 Elsevier Science B.V. All rights reserved.

KW - Chemical vapour deposition

KW - Chemisorption

KW - Glass surfaces

KW - Infra-red absorption spectroscopy

KW - Reflection spectroscopy

KW - Silicon oxide

KW - SnCl4

KW - Tin oxides

M3 - Article

SN - 0039-6028

VL - 418

SP - -L7

JO - Surface Science

JF - Surface Science

IS - 1

ER -

A far-infrared RAIRS investigation of SnCl4 on a silica surface using the buried metal layer approach

Abstract

Keywords

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