A novel and potentially scalable CVD-based route toward SnO2:Mo thin films as transparent conducting oxides

Tianlei Ma, Marek Nikiel, Andrew G. Thomas, Mohamed Missous, David J. Lewis

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Abstract

In this report, we prepared transparent and conducting undoped and molybdenum-doped tin oxide (Mo–SnO2) thin films by aerosol-assisted chemical vapour deposition (AACVD). The relationship between the precursor concentration in the feed and in the resulting films was studied by energy-dispersive X-ray spectroscopy, suggesting that the efficiency of doping is quantitative and that this method could potentially impart exquisite control over dopant levels. All SnO2 films were in tetragonal structure as confirmed by powder X-ray diffraction measurements. X-ray photoelectron spectroscopy characterisation indicated for the first time that Mo ions were in mixed valence states of Mo(VI) and Mo(V) on the surface. Incorporation of Mo6+ resulted in the lowest resistivity of 7.3×10-3Ωcm, compared to pure SnO2 films with resistivities of 4.3(0)×10-2Ωcm. Meanwhile, a high transmittance of 83% in the visible light range was also acquired. This work presents a comprehensive investigation into impact of Mo doping on SnO2 films synthesised by AACVD for the first time and establishes the potential for scalable deposition of SnO2:Mo thin films in TCO manufacturing. 

Original languageEnglish
Pages (from-to)15921-15936
Number of pages16
JournalJournal of Materials Science
Volume56
Issue number28
Early online date12 Jul 2021
DOIs
Publication statusPublished - 1 Oct 2021

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