A novel gate insulator for flexible electronics

Leszek Majewski, Martin Grell, Simon Ogier, Janos Veres

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Field effect transistors using a poly(triaryl amine) p-channel organic semiconductor in conjunction with anodised aluminium oxide as the gate insulator (Al2O3 on Al) are demonstrated. Anodised films are pinhole-free, homogenous oxide layers of precisely controlled thickness. The anodisation process requires no vacuum steps; anodised Al2O3 is insoluble in organic solvents, and Al films are cheaply available as laminates on flexible substrates. Anodised Al2O3 is confirmed to have high gate capacitance (60 nF/cm2) and electric breakdown strength (>3 MV/cm in the working device). This property profile answers to the demands on gate insulators for flexible electronics applications.
    Original languageEnglish
    Pages (from-to)27-32
    Number of pages6
    JournalOrganic Electronics
    Volume4
    Issue number1
    Publication statusPublished - 15 Mar 2003

    Keywords

    • Anodisation
    • Aluminium oxide
    • Organic field-effect transistor (OFET)

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