A Photoelectron Diffraction Study of the Structure of Pf3 Adsorbed on Ni(111)

R Dippel; K U Weiss; K M Schindler; P Gardner; V Fritzsche; A M Bradshaw; M C Asensio; X M Hu; D P Woodruff; A R Gonzalezelipe

A Photoelectron Diffraction Study of the Structure of Pf3 Adsorbed on Ni(111)

R Dippel, K U Weiss, K M Schindler, P Gardner, V Fritzsche, A M Bradshaw, M C Asensio, X M Hu, D P Woodruff, A R Gonzalezelipe

Research output: Contribution to journal › Article › peer-review

Abstract

The technique of scanned energy photoelectron diffraction has been used to study the structure PF3 adsorbed on a Ni{111} surface. The molecule adsorbs in an atop site with a Ni-P separation of 2.07 (+/- 0.03) angstrom and gives rise to an expansion of the Ni-Ni outermost layer spacing of 0.03 (+/- 0.05) angstrom.

Original language	English
Pages (from-to)	625-630
Number of pages	6
Journal	Chemical Physics Letters
Volume	199
Issue number	6
Publication status	Published - 1992

Cite this

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title = "A Photoelectron Diffraction Study of the Structure of Pf3 Adsorbed on Ni(111)",

abstract = "The technique of scanned energy photoelectron diffraction has been used to study the structure PF3 adsorbed on a Ni{111} surface. The molecule adsorbs in an atop site with a Ni-P separation of 2.07 (+/- 0.03) angstrom and gives rise to an expansion of the Ni-Ni outermost layer spacing of 0.03 (+/- 0.05) angstrom.",

author = "R Dippel and Weiss, {K U} and Schindler, {K M} and P Gardner and V Fritzsche and Bradshaw, {A M} and Asensio, {M C} and Hu, {X M} and Woodruff, {D P} and Gonzalezelipe, {A R}",

year = "1992",

language = "English",

volume = "199",

pages = "625--630",

journal = "Chemical Physics Letters",

issn = "0009-2614",

publisher = "Elsevier BV",

number = "6",

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TY - JOUR

T1 - A Photoelectron Diffraction Study of the Structure of Pf3 Adsorbed on Ni(111)

AU - Dippel, R

AU - Weiss, K U

AU - Schindler, K M

AU - Gardner, P

AU - Fritzsche, V

AU - Bradshaw, A M

AU - Asensio, M C

AU - Hu, X M

AU - Woodruff, D P

AU - Gonzalezelipe, A R

PY - 1992

Y1 - 1992

N2 - The technique of scanned energy photoelectron diffraction has been used to study the structure PF3 adsorbed on a Ni{111} surface. The molecule adsorbs in an atop site with a Ni-P separation of 2.07 (+/- 0.03) angstrom and gives rise to an expansion of the Ni-Ni outermost layer spacing of 0.03 (+/- 0.05) angstrom.

AB - The technique of scanned energy photoelectron diffraction has been used to study the structure PF3 adsorbed on a Ni{111} surface. The molecule adsorbs in an atop site with a Ni-P separation of 2.07 (+/- 0.03) angstrom and gives rise to an expansion of the Ni-Ni outermost layer spacing of 0.03 (+/- 0.05) angstrom.

M3 - Article

SN - 0009-2614

VL - 199

SP - 625

EP - 630

JO - Chemical Physics Letters

JF - Chemical Physics Letters

IS - 6

ER -

A Photoelectron Diffraction Study of the Structure of Pf3 Adsorbed on Ni(111)

Abstract

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