A Single Source Precursor for Tungsten Dichalcogenide Thin Films: Mo1-xWxS2 (0 ≤ x ≤ 1) Alloys by Aerosol-Assisted Chemical Vapor Deposition (AACVD)

Aleksander Tedstone, Edward Lewis, Nicky Savjani, Xiang Li Zhong, Sarah Haigh, Paul O'Brien, David Lewis

    Research output: Contribution to journal › Article › peer-review

    Fingerprint

    Dive into the research topics of 'A Single Source Precursor for Tungsten Dichalcogenide Thin Films: Mo1-xWxS2 (0 ≤ x ≤ 1) Alloys by Aerosol-Assisted Chemical Vapor Deposition (AACVD)'. Together they form a unique fingerprint.

    Material Science

    Chemistry