Abstract
Rendering woven fabrics is challenging due to the complex micro geometry and anisotropy appearance. Conventional solutions either fully model every yarn/ply/fibre for high fidelity at a high computational cost, or ignore details, that produce non-realistic close-up renderings. In this paper, we introduce a model that shares the advantages of both. Our model requires only binary patterns as input yet offers all the necessary micro-level details by adding the yarn/ply/fibre implicitly. Moreover, we design a double-layer representation to handle light transmission accurately and use a constant timed (mathematical equation) approach to accurately and efficiently depict parallax and shadowing-masking effects in a tandem way. We compare our model with curve-based and surface-based, on different patterns, under different lighting and evaluate with photographs to ensure capturing the aforementioned realistic effects.
Original language | English |
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Article number | e15283 |
Journal | Computer Graphics Forum |
Volume | 44 |
Issue number | 1 |
Early online date | 2 Feb 2025 |
DOIs | |
Publication status | Published - 27 Feb 2025 |