AACVD of Molybdenum Sulfide and Oxide Thin Films From Molybdenum(V)-based Single-source Precursors

Nicky Savjani, Jack R. Brent, Paul O'Brien

Research output: Contribution to journalArticlepeer-review

Abstract

The decomposition of Mo2O3(S2CNEt2) 4 (1) and Mo2O3(S2COEt)4 (2) single-source precursors (SSPs) via aerosol-assisted (AA) CVD onto glass substrates is reported. The films grown from 2 are achieved at a lower temperature than 1 (300 and 425 °C, respectively), potentially attributable to the Chugaev elimination mechanism. Raman spectroscopy (RS) and scanning electron microscopy (SEM) show the composition of the films to be variable; films that are grown from the AACVD reaction of 1 are found to be of pure MoS2 nanoplates, whereas those grown from 2 consist of MoO3 microparticles and MoO2 noncrystalline films, together with various nanostructures of MoS2, depending on deposition temperature. The decomposition processes of the SSPs are assessed to determine why these variations in thin films are seen.
Original languageEnglish
Pages (from-to)71-77
Number of pages7
JournalChemical Vapor Deposition
Volume21
Issue number1-3
Early online date7 Jan 2015
DOIs
Publication statusPublished - Mar 2015

Keywords

  • AACVD
  • breakdown mechanism
  • molybdenum oxides
  • molybdenum sulfides
  • two-dimensional structures

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