Aerosol assisted chemical vapour deposition of Cu-ZnO composite from single source precursors

Muhammad Shahid, Muhammad Mazhar, Mazhar Hamid, Paul O'Brien, Mohammad A. Malik, Madeleine Helliwell, James Raftery

    Research output: Contribution to journalArticlepeer-review


    Two heterobimetallic precursors [Zn(TFA)3(μ-OH)Cu 3(dmae)3Cl]·THF (1) and [Zn(TFA)4Cu 3(dmae)4] (2) [dmae = N,N-dimethylaminoethanolate and TFA = trifluoroacetate], have been synthesized and characterized by their melting points, elemental analysis, FT-IR spectroscopy, mass spectrometry, TGA and single crystal X-ray diffraction methods. Both complexes were used to deposit thin films of Cu-ZnO composite on glass substrates by aerosol assisted chemical vapor deposition (AACVD) method. The films were characterized by "scotch tape" test for adhesion, thickness measurement as a function of temperature, EDX for composition, SEM for surface morphology and XRD for crystalline phases. Thin film deposition studies at 250, 325, 400, 475 °C indicated the increase in thickness with temperature reaching a maximum at 400 °C and then decreasing. EDX and PXRD results showed the uniform distribution of cubic metallic copper and hexagonal zinc oxide phases which make them useful for nanocatalysis on structured surfaces. © The Royal Society of Chemistry 2009.
    Original languageEnglish
    Pages (from-to)5487-5494
    Number of pages7
    JournalDalton Transactions
    Issue number28
    Publication statusPublished - 2009


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