TY - JOUR
T1 - An investigation into the effects of plasma bombardment anisotropy in low frequency r.f. glow discharges
AU - James, A. S.
AU - Fancey, K. S.
AU - Matthews, A.
PY - 1991/7/7
Y1 - 1991/7/7
N2 - The effects of plasma bombardment variations at the substrate surface in low frequency (380 kHz) r.f. glow discharges, as used in some r.f. plasma-assisted physical vapour deposition processes, was investigated by means of a sputter weight loss technique. Experiments were performed at a range of argon pressures and powder densities and the results compared with previously published work. It was found that the bombardment variations in the r.f. discharges were very similar to those observed in d.c. diodes, with a small additional contribution attributed to electron emission from the chamber walls which is thought to cause bombardment changes as a result of creating additional ions in the vicinity of the walls. The work is of significance in coating and plasma treatment applications because of the profound effects ion bombardment has, for example, on coating thickness uniformity, coating structure and diffusional effects.
AB - The effects of plasma bombardment variations at the substrate surface in low frequency (380 kHz) r.f. glow discharges, as used in some r.f. plasma-assisted physical vapour deposition processes, was investigated by means of a sputter weight loss technique. Experiments were performed at a range of argon pressures and powder densities and the results compared with previously published work. It was found that the bombardment variations in the r.f. discharges were very similar to those observed in d.c. diodes, with a small additional contribution attributed to electron emission from the chamber walls which is thought to cause bombardment changes as a result of creating additional ions in the vicinity of the walls. The work is of significance in coating and plasma treatment applications because of the profound effects ion bombardment has, for example, on coating thickness uniformity, coating structure and diffusional effects.
UR - http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:A1991GF27200015&KeyUID=WOS:A1991GF27200015
U2 - 10.1016/0921-5093(91)90472-Y
DO - 10.1016/0921-5093(91)90472-Y
M3 - Article
SN - 0921-5093
VL - 140
SP - 517
EP - 522
JO - Materials Science And Engineering A-Structural Materials Properties Microstructure And Processing
JF - Materials Science And Engineering A-Structural Materials Properties Microstructure And Processing
ER -