An oxygen k-edge nexafs study of h20 adsorption on si(Lll)

Robert Lindsay; Paul L. Wincott; Christopher A. Muryn; Geoffrey Thornton; Sean P. Frigo; Richard A. Rosenberg

doi:10.7567/JJAPS.32S2.347

An oxygen k-edge nexafs study of h20 adsorption on si(Lll)

Robert Lindsay, Paul L. Wincott, Christopher A. Muryn, Geoffrey Thornton, Sean P. Frigo, Richard A. Rosenberg

Research output: Contribution to journal › Article › peer-review

Abstract

The polarisation dependence of the oxygen K-edge Near Edge X-ray Absorption Fine Structure from Si(l 11)7x7- OH has been measured using synchrotron radiation. No discernible polarisation dependence is observed. This is consistent with earlier angle-resolved photoemission data and the width of the white line in indicating that the Si-OH bond is tilted away from the surface normal.

Original language	English
Pages (from-to)	347-349
Number of pages	3
Journal	Japanese Journal of Applied Physics
Volume	32
DOIs	https://doi.org/10.7567/JJAPS.32S2.347
Publication status	Published - Jan 1993

Keywords

Nexafs
Silicon
Water adsorption

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10.7567/JJAPS.32S2.347

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title = "An oxygen k-edge nexafs study of h20 adsorption on si(Lll)",

abstract = "The polarisation dependence of the oxygen K-edge Near Edge X-ray Absorption Fine Structure from Si(l 11)7x7- OH has been measured using synchrotron radiation. No discernible polarisation dependence is observed. This is consistent with earlier angle-resolved photoemission data and the width of the white line in indicating that the Si-OH bond is tilted away from the surface normal.",

keywords = "Nexafs, Silicon, Water adsorption",

author = "Robert Lindsay and Wincott, {Paul L.} and Muryn, {Christopher A.} and Geoffrey Thornton and Frigo, {Sean P.} and Rosenberg, {Richard A.}",

year = "1993",

month = jan,

doi = "10.7567/JJAPS.32S2.347",

language = "English",

volume = "32",

pages = "347--349",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

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T1 - An oxygen k-edge nexafs study of h20 adsorption on si(Lll)

AU - Lindsay, Robert

AU - Wincott, Paul L.

AU - Muryn, Christopher A.

AU - Thornton, Geoffrey

AU - Frigo, Sean P.

AU - Rosenberg, Richard A.

PY - 1993/1

Y1 - 1993/1

N2 - The polarisation dependence of the oxygen K-edge Near Edge X-ray Absorption Fine Structure from Si(l 11)7x7- OH has been measured using synchrotron radiation. No discernible polarisation dependence is observed. This is consistent with earlier angle-resolved photoemission data and the width of the white line in indicating that the Si-OH bond is tilted away from the surface normal.

AB - The polarisation dependence of the oxygen K-edge Near Edge X-ray Absorption Fine Structure from Si(l 11)7x7- OH has been measured using synchrotron radiation. No discernible polarisation dependence is observed. This is consistent with earlier angle-resolved photoemission data and the width of the white line in indicating that the Si-OH bond is tilted away from the surface normal.

KW - Nexafs

KW - Silicon

KW - Water adsorption

UR - http://www.scopus.com/inward/record.url?scp=0001761848&partnerID=8YFLogxK

U2 - 10.7567/JJAPS.32S2.347

DO - 10.7567/JJAPS.32S2.347

M3 - Article

AN - SCOPUS:0001761848

SN - 0021-4922

VL - 32

SP - 347

EP - 349

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

ER -

An oxygen k-edge nexafs study of h20 adsorption on si(Lll)

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Keywords

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