An oxygen k-edge nexafs study of h20 adsorption on si(Lll)

Robert Lindsay, Paul L. Wincott, Christopher A. Muryn, Geoffrey Thornton, Sean P. Frigo, Richard A. Rosenberg

Research output: Contribution to journalArticlepeer-review


The polarisation dependence of the oxygen K-edge Near Edge X-ray Absorption Fine Structure from Si(l 11)7x7- OH has been measured using synchrotron radiation. No discernible polarisation dependence is observed. This is consistent with earlier angle-resolved photoemission data and the width of the white line in indicating that the Si-OH bond is tilted away from the surface normal.

Original languageEnglish
Pages (from-to)347-349
Number of pages3
JournalJapanese Journal of Applied Physics
Publication statusPublished - Jan 1993


  • Nexafs
  • Silicon
  • Water adsorption


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