Anodic film growth on Al-Li-Cu alloy AA2099-T8

Y. Ma, X. Zhou, G. E. Thompson, M. Curioni, P. Skeldon, X. Zhang, Z. Sun, C. Luo, Z. Tang, F. Lu

    Research output: Contribution to journalArticlepeer-review

    Abstract

    AA2099-T8 aluminium alloy was anodized at a current density of 5 mA/cm 2 to selected voltages in 0.1 M ammonium pentaborate electrolyte at 293 K. It was found that the growth of barrier-type anodic film on the alloy was accompanied by oxidation of intermetallics, formation and rupture of oxygen gas-filled voids in the anodic film and healing of the anodic film at the sites of rupture. It was revealed that the formation of oxygen gas-filled voids was related to the oxidation of copper-rich nanoparticles in the copper-enriched layer at the film/alloy interface, and that the oxidation process of copper-rich nanoparticles depended on grain orientation. Further, the significantly reduced Pilling-Bedworth ratio for formation of anodic lithium oxide compared with that for formation of anodic alumina resulted in the formation of fine voids at the alloy/film interface and sequentially, detachment of the anodic film from the alloy surface. © 2012 Elsevier Ltd.
    Original languageEnglish
    Pages (from-to)148-159
    Number of pages11
    JournalElectrochimica Acta
    Volume80
    DOIs
    Publication statusPublished - 1 Oct 2012

    Keywords

    • Aluminum alloy
    • Anodizing
    • Film detachment
    • Grain orientation
    • Lithium

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