Application of nuclear resonance analysis and narrow resonance profiling in understanding porous film growth on aluminium.

P. Skeldon, A. Baron-Wiecheć, G.E. Thompson, J.J. Ganem, I.C. Vickridge

Research output: Contribution to conference › Poster

Original language	English
Publication status	Published - 2011
Event	International Workshop on High-Resolution Depth Profiling - Paris Duration: 27 Jun 2011 → 30 Jun 2011

Conference	International Workshop on High-Resolution Depth Profiling
City	Paris
Period	27/06/11 → 30/06/11

Cite this

@conference{ae494fe6a1c64bc09962430c2d744616,

title = "Application of nuclear resonance analysis and narrow resonance profiling in understanding porous film growth on aluminium.",

author = "P. Skeldon and A. Baron-Wieche{\'c} and G.E. Thompson and J.J. Ganem and I.C. Vickridge",

year = "2011",

language = "English",

note = "International Workshop on High-Resolution Depth Profiling ; Conference date: 27-06-2011 Through 30-06-2011",

}

TY - CONF

T1 - Application of nuclear resonance analysis and narrow resonance profiling in understanding porous film growth on aluminium.

AU - Skeldon, P.

AU - Baron-Wiecheć, A.

AU - Thompson, G.E.

AU - Ganem, J.J.

AU - Vickridge, I.C.

PY - 2011

Y1 - 2011

M3 - Poster

T2 - International Workshop on High-Resolution Depth Profiling

Y2 - 27 June 2011 through 30 June 2011

ER -