Atomically resolved chemical ordering at the nm-thick TiO precipitate/matrix interface in V-4Ti-4Cr alloy

Andrea Impagnatiello, David Hernandez-Maldonado, Giacomo Bertali, Eric Prestat, Demi Kepaptsoglou, Quentin Ramasse, Sarah Haigh, Enrique Jimenez-Melero

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    Abstract

    We have used advanced analytical electron microscopy to characterise the local structure and chemistry at the interface between nm-thick TiO precipitates and the V-based matrix in a V-4Ti-4Cr alloy. Our results reveal the presence of an intergrowth between the fcc TiO and bcc vanadium structures, with a repeat lattice distance that equals 2.5 times the vanadium lattice parameter along the c-axis. Our atomic resolution analysis of the interface will impact the mechanistic understanding of its interaction with interstitials and radiation-induced lattice
    defects, and consequently trigger the development of improved alloy structures with interfaces engineered for enhanced radiation tolerance.
    Original languageEnglish
    Pages (from-to)50-54
    Number of pages5
    JournalScripta Materialia
    Volume126
    Early online date30 Aug 2016
    DOIs
    Publication statusPublished - 1 Jan 2017

    Keywords

    • Refractory metal
    • Crystalline oxides
    • Lattice defects
    • High-resolution electron microscopy
    • Nuclear fusion reactor

    Research Beacons, Institutes and Platforms

    • Advanced materials
    • Energy

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