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Abstract
We have used advanced analytical electron microscopy to characterise the local structure and chemistry at the interface between nm-thick TiO precipitates and the V-based matrix in a V-4Ti-4Cr alloy. Our results reveal the presence of an intergrowth between the fcc TiO and bcc vanadium structures, with a repeat lattice distance that equals 2.5 times the vanadium lattice parameter along the c-axis. Our atomic resolution analysis of the interface will impact the mechanistic understanding of its interaction with interstitials and radiation-induced lattice
defects, and consequently trigger the development of improved alloy structures with interfaces engineered for enhanced radiation tolerance.
defects, and consequently trigger the development of improved alloy structures with interfaces engineered for enhanced radiation tolerance.
Original language | English |
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Pages (from-to) | 50-54 |
Number of pages | 5 |
Journal | Scripta Materialia |
Volume | 126 |
Early online date | 30 Aug 2016 |
DOIs | |
Publication status | Published - 1 Jan 2017 |
Keywords
- Refractory metal
- Crystalline oxides
- Lattice defects
- High-resolution electron microscopy
- Nuclear fusion reactor
Research Beacons, Institutes and Platforms
- Advanced materials
- Energy
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Dive into the research topics of 'Atomically resolved chemical ordering at the nm-thick TiO precipitate/matrix interface in V-4Ti-4Cr alloy'. Together they form a unique fingerprint.Projects
- 1 Finished
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Next Generation Multi-Dimensional X-ray Imaging
Withers, P. (PI), Burke, G. (CoI), Cernik, R. (CoI), Haigh, S. (CoI), Lee, P. (CoI) & Lionheart, W. (CoI)
1/02/15 → 31/01/20
Project: Research