Batch fabrication of insulated conductive scanning probe microscopy probes with reduced capacitive coupling

Y. Birhane, J. Otero, F. Pérez-Murano, L. Fumagalli, G. Gomila, J. Bausells*

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    Abstract

    We report a novel fabrication process for the batch fabrication of insulated conductive scanning probe microscopy (SPM) probes for electrical and topographic characterization of soft samples in liquid media at the nanoscale. The whole SPM probe structure is insulated with a dielectric material except at the very tip end and at the contact pad area to minimize the leakage current in liquid. Additionally, the geometry of the conducting layer in the probe cantilever and substrate is engineered to reduce the parasitic capacitance coupling with the sample. The electrical characterization of the probes has shown that parasitic capacitances are significantly reduced as compared to fully metallized cantilevers.

    Original languageEnglish
    Pages (from-to)44-47
    Number of pages4
    JournalMicroelectronic Engineering
    Volume119
    DOIs
    Publication statusPublished - 1 May 2014

    Keywords

    • Conductive scanning probe microscopy (C-SPM)
    • EFM
    • SECM
    • SECM-AFM
    • SIM

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