Breakdown and degradation of ultrathin Hf-based (HfO2)x (SiO2)1-x gate oxide films

H. J. Uppal, I. Z. Mitrovic, S. Hall, B. Hamilton, V. Markevich, A. R. Peaker

    Research output: Contribution to journal › Article › peer-review

    Fingerprint

    Dive into the research topics of 'Breakdown and degradation of ultrathin Hf-based (HfO2)x (SiO2)1-x gate oxide films'. Together they form a unique fingerprint.

    Material Science