Characterisation of duplex and non-duplex (Ti, Al)N and Cr-N PVD coatings

Engineering

• Physical Vapor Deposition 100%
• Plasma Nitriding 100%
• Ray Diffraction 66%
• Glow Discharge 66%
• Critical Load 66%
• Substrate Surface 33%
• Layer Structure 33%
• Deposition Temperature 33%
• Bearing Capacity 33%
• Coating Deposition 33%
• Duplex Treatment 33%
• Cross Section 33%

Material Science

• Nitriding 100%
• Physical Vapor Deposition 100%
• Emission Spectroscopy 66%
• X-Ray Diffraction 33%
• Scanning Electron Microscopy 33%
• Plating 33%
• Analytical Method 33%
• Bearing Capacity 33%
• Surface Roughness 33%
• X-Ray Diffractometry 33%