Characterization of nitride thin films by electron backscatter diffraction and electron channeling contrast imaging

C. Trager-Cowan*, F. Sweeney, A. J. Wilkinson, P. W. Trimby, Austin Day, A. Gholinia, N. H. Schmidt, P. J. Parbrook, I. M. Watson

*Corresponding author for this work

Research output: Chapter in Book/Conference proceedingConference contributionpeer-review

Abstract

In this paper we describe the use of electron backscatter diffraction (EBSD) mapping and electron channeling contrast imaging - in the scanning electron microscope - to study tilt, atomic steps and dislocations in epitaxial GaN thin films. We show results from epitaxial GaN thin films and from a just coalesced epitaxial laterally overgrown GaN thin film. From our results we deduce that EBSD may be used to measure orientation changes of the order of 0.02°, in GaN thin films. As EBSD has a spatial resolution of a 20 nm, this means we have a powerful technique with which to quantitatively map surface tilt. We also demonstrate that channeling contrast in electron channeling contrast images may be used to image tilt, atomic steps and threading dislocations in GaN thin films.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages677-682
Number of pages6
Publication statusPublished - 15 May 2006
Event2005 Materials Research Society Fall Meeting - Boston, MA, United States
Duration: 28 Nov 20052 Dec 2005

Publication series

NameMaterials Research Society Symposium Proceedings
Volume892
ISSN (Print)0272-9172

Conference

Conference2005 Materials Research Society Fall Meeting
Country/TerritoryUnited States
CityBoston, MA
Period28/11/052/12/05

Fingerprint

Dive into the research topics of 'Characterization of nitride thin films by electron backscatter diffraction and electron channeling contrast imaging'. Together they form a unique fingerprint.

Cite this