Characterization of quantum well structures using microscope-spectrophotometry

Rachel M. Geatches*, Karen J. Reeson, Alan J. Criddle, Roger P. Webb

*Corresponding author for this work

    Research output: Chapter in Book/Conference proceedingConference contributionpeer-review

    Abstract

    In this paper the application of microscope-spectrophotometry to the nondestructive characterization of a variety of multi-layer GaAs/AlGaAs structures, is described. Spectral reflectance results are used to indirectly determine variations in aluminum content, and the interdependency of aluminum content with layer thicknesses. The penetration depth of light from the visible spectrum is assessed from the correlation between spectral reflectance measurements and fitted optical models. Finally, a series of single quantum wells are investigated, and it is concluded that a significant improvement in the characterization of these materials will be achieved with an extension of the spectral measurement range into the ultra violet.

    Original languageEnglish
    Title of host publicationMaterials Research Society Symposium Proceedings
    PublisherMaterials Research Society
    Pages111-117
    Number of pages7
    Volume324
    ISBN (Print)1558992235
    Publication statusPublished - 1994
    EventProceedings of the 1993 Fall Meeting of the Materials Research Society - Boston, MA, USA
    Duration: 29 Nov 19932 Dec 1993

    Conference

    ConferenceProceedings of the 1993 Fall Meeting of the Materials Research Society
    CityBoston, MA, USA
    Period29/11/932/12/93

    Fingerprint

    Dive into the research topics of 'Characterization of quantum well structures using microscope-spectrophotometry'. Together they form a unique fingerprint.

    Cite this