Chemical vapour deposition of chromium-doped tungsten disulphide thin films on glass and steel substrates from molecular precursors

Ghulam Murtaza; Sai P. Venkateswaran; Andrew G. Thomas; Paul O'Brien; David J. Lewis

doi:10.1039/c8tc01991f

Chemical vapour deposition of chromium-doped tungsten disulphide thin films on glass and steel substrates from molecular precursors

Ghulam Murtaza, Sai P. Venkateswaran, Andrew G. Thomas, Paul O'Brien^*, David J. Lewis

^*Corresponding author for this work

Materials Engineering

BP America Incorporated

Research output: Contribution to journal › Article › peer-review

317 Downloads (Pure)

Abstract

Polycrystalline thin films of chromium doped tungsten disulphide (WS₂) have been deposited onto glass and steel substrates by Aerosol-Assisted Chemical Vapour Deposition (AACVD) using bis(diethyldithiocarbamato)disulfidothioxo tungsten(vi) (WS₃L₂) and tris(diethyldithiocarbamato) chromium(iii) [Cr(S₂CNEt₂)₃] (CrL₃) complexes as precursors in different molar ratios at 450 °C. The deposited films were characterised by p-XRD, SEM, and EDX and Raman spectroscopies. Chromium doping of up to 15 mol% was achieved in WS₂ thin films.

Original language	English
Pages (from-to)	9537-9544
Number of pages	8
Journal	Journal of Materials Chemistry C
Volume	6
Issue number	35
Early online date	13 Aug 2018
DOIs	https://doi.org/10.1039/c8tc01991f
Publication status	Published - 2018

Research Beacons, Institutes and Platforms

Photon Science Institute

Access to Document

10.1039/c8tc01991f

Murtaza_JMCC_2018Accepted author manuscript, 1.27 MB

Cite this

@article{7646a33696a8436891a8aa772108c40e,

title = "Chemical vapour deposition of chromium-doped tungsten disulphide thin films on glass and steel substrates from molecular precursors",

abstract = "Polycrystalline thin films of chromium doped tungsten disulphide (WS2) have been deposited onto glass and steel substrates by Aerosol-Assisted Chemical Vapour Deposition (AACVD) using bis(diethyldithiocarbamato)disulfidothioxo tungsten(vi) (WS3L2) and tris(diethyldithiocarbamato) chromium(iii) [Cr(S2CNEt2)3] (CrL3) complexes as precursors in different molar ratios at 450 °C. The deposited films were characterised by p-XRD, SEM, and EDX and Raman spectroscopies. Chromium doping of up to 15 mol% was achieved in WS2 thin films.",

author = "Ghulam Murtaza and Venkateswaran, {Sai P.} and Thomas, {Andrew G.} and Paul O'Brien and Lewis, {David J.}",

year = "2018",

doi = "10.1039/c8tc01991f",

language = "English",

volume = "6",

pages = "9537--9544",

journal = "Journal of Materials Chemistry C",

issn = "2050-7526",

publisher = "Royal Society of Chemistry",

number = "35",

}

TY - JOUR

T1 - Chemical vapour deposition of chromium-doped tungsten disulphide thin films on glass and steel substrates from molecular precursors

AU - Murtaza, Ghulam

AU - Venkateswaran, Sai P.

AU - Thomas, Andrew G.

AU - O'Brien, Paul

AU - Lewis, David J.

PY - 2018

Y1 - 2018

N2 - Polycrystalline thin films of chromium doped tungsten disulphide (WS2) have been deposited onto glass and steel substrates by Aerosol-Assisted Chemical Vapour Deposition (AACVD) using bis(diethyldithiocarbamato)disulfidothioxo tungsten(vi) (WS3L2) and tris(diethyldithiocarbamato) chromium(iii) [Cr(S2CNEt2)3] (CrL3) complexes as precursors in different molar ratios at 450 °C. The deposited films were characterised by p-XRD, SEM, and EDX and Raman spectroscopies. Chromium doping of up to 15 mol% was achieved in WS2 thin films.

AB - Polycrystalline thin films of chromium doped tungsten disulphide (WS2) have been deposited onto glass and steel substrates by Aerosol-Assisted Chemical Vapour Deposition (AACVD) using bis(diethyldithiocarbamato)disulfidothioxo tungsten(vi) (WS3L2) and tris(diethyldithiocarbamato) chromium(iii) [Cr(S2CNEt2)3] (CrL3) complexes as precursors in different molar ratios at 450 °C. The deposited films were characterised by p-XRD, SEM, and EDX and Raman spectroscopies. Chromium doping of up to 15 mol% was achieved in WS2 thin films.

UR - http://www.scopus.com/inward/record.url?scp=85053471902&partnerID=8YFLogxK

U2 - 10.1039/c8tc01991f

DO - 10.1039/c8tc01991f

M3 - Article

AN - SCOPUS:85053471902

SN - 2050-7526

VL - 6

SP - 9537

EP - 9544

JO - Journal of Materials Chemistry C

JF - Journal of Materials Chemistry C

IS - 35

ER -

Chemical vapour deposition of chromium-doped tungsten disulphide thin films on glass and steel substrates from molecular precursors

Abstract

Research Beacons, Institutes and Platforms

Access to Document

Other files and links

Fingerprint

Cite this