CNT-FET Schottky Barrier devices fabricated by E-beam lithography

D. Perello; Moon J, Kim; Seung Yol Jeong; B. R. Kang; D. J. Bae; Hee Young Lee; Minhee Yun

doi:10.1017/S1431927608083086

CNT-FET Schottky Barrier devices fabricated by E-beam lithography

D. Perello^*, Moon J, Kim, Seung Yol Jeong, B. R. Kang, D. J. Bae, Hee Young Lee, Minhee Yun

^*Corresponding author for this work

Condensed Matter Physics Group

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	410-411
Number of pages	2
Journal	Microscopy and Microanalysis
Volume	14
Issue number	Suppl. 2
DOIs	https://doi.org/10.1017/S1431927608083086
Publication status	Published - 1 Aug 2008

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title = "CNT-FET Schottky Barrier devices fabricated by E-beam lithography",

author = "D. Perello and Kim, {Moon J,} and Jeong, {Seung Yol} and Kang, {B. R.} and Bae, {D. J.} and Lee, {Hee Young} and Minhee Yun",

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doi = "10.1017/S1431927608083086",

language = "English",

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T1 - CNT-FET Schottky Barrier devices fabricated by E-beam lithography

AU - Perello, D.

AU - Kim, Moon J,

AU - Jeong, Seung Yol

AU - Kang, B. R.

AU - Bae, D. J.

AU - Lee, Hee Young

AU - Yun, Minhee

PY - 2008/8/1

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DO - 10.1017/S1431927608083086

M3 - Article

AN - SCOPUS:49549108471

SN - 1431-9276

VL - 14

SP - 410

EP - 411

JO - Microscopy and Microanalysis

JF - Microscopy and Microanalysis

IS - Suppl. 2

ER -

CNT-FET Schottky Barrier devices fabricated by E-beam lithography

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