Computer aided geometric design of strip using developable Bézier patches

Chih-Hsing Chu, Charlie C.L. Wang, Chi-Rung Tsai

Research output: Contribution to journalArticlepeer-review

Abstract

Developable strip is commonly used in product design due to its ease of manufacture. This paper proposes an algorithm for geometric design of strip using developable Bézier patches. It computes an aggregate of triangular and quadrilateral patches interpolate two given space curves defining a strip. The computation process selects optimal solutions in terms of surface assessment criteria specified by the user. Each patch is then degree-elevated to gain extra degrees of freedom, which produce G1 across the patch boundaries by modifying the control points while preserving the surface developability. Test examples with different design parameters illustrate and validate the feasibility of the proposed algorithm. In comparison with previous studies, this work allows strip design with freeform developable patches, generates better results in the surface assessment, and provides more flexible control on the design shape. It serves as a simple but effective approach for computer aided geometric design of developable strip.

Original languageEnglish
Pages (from-to)601-611
Number of pages11
JournalComputers in Industry
Volume59
Issue number6
DOIs
Publication statusE-pub ahead of print - 28 Apr 2008

Keywords

  • Bézier patch
  • Computer-aided geometric design
  • Developable strip
  • Shape design

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