Correlation of elastic modulus, hardness and density for sputtered TiAlBN thin films

C. Rebholz; A. Leyland; A. Matthews; C. Charitidis; S. Logothetidis; D. Schneider

doi:10.1016/j.tsf.2006.02.038

Correlation of elastic modulus, hardness and density for sputtered TiAlBN thin films

C. Rebholz^*, A. Leyland, A. Matthews, C. Charitidis, S. Logothetidis, D. Schneider

^*Corresponding author for this work

Materials Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

This paper describes the correlation between the elastic modulus, hardness and density of mainly X-ray amorphous TiAl_xB_yN_z (0.29 ≤ x ≤ 1.32; 1.15 ≤ y ≤ 2.07; 0.37 ≤ z ≤ 2.19) films, deposited by simultaneous reactive magnetron sputtering from TiAl and TiB₂ targets onto AISI 316 stainless steel and Si(100) substrates in Ar/N₂ mixtures at 150 °C. The elastic modulus, hardness and density were found to depend on chemical composition and the phases present, and an approximately linear correlation between elastic modulus and hardness could be established. The elastic modulus and hardness were also found to be a function of film density, except in films containing significant amounts of BN.

Original language	English
Pages (from-to)	81-86
Number of pages	6
Journal	Thin Solid Films
Volume	514
Issue number	1-2
DOIs	https://doi.org/10.1016/j.tsf.2006.02.038
Publication status	Published - 30 Aug 2006

Keywords

Elastic properties
Hardness
Physical vapour deposition (PVD)
Sputtering

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10.1016/j.tsf.2006.02.038

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title = "Correlation of elastic modulus, hardness and density for sputtered TiAlBN thin films",

abstract = "This paper describes the correlation between the elastic modulus, hardness and density of mainly X-ray amorphous TiAlxByNz (0.29 ≤ x ≤ 1.32; 1.15 ≤ y ≤ 2.07; 0.37 ≤ z ≤ 2.19) films, deposited by simultaneous reactive magnetron sputtering from TiAl and TiB2 targets onto AISI 316 stainless steel and Si(100) substrates in Ar/N2 mixtures at 150 °C. The elastic modulus, hardness and density were found to depend on chemical composition and the phases present, and an approximately linear correlation between elastic modulus and hardness could be established. The elastic modulus and hardness were also found to be a function of film density, except in films containing significant amounts of BN.",

keywords = "Elastic properties, Hardness, Physical vapour deposition (PVD), Sputtering",

author = "C. Rebholz and A. Leyland and A. Matthews and C. Charitidis and S. Logothetidis and D. Schneider",

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TY - JOUR

T1 - Correlation of elastic modulus, hardness and density for sputtered TiAlBN thin films

AU - Rebholz, C.

AU - Leyland, A.

AU - Matthews, A.

AU - Charitidis, C.

AU - Logothetidis, S.

AU - Schneider, D.

PY - 2006/8/30

Y1 - 2006/8/30

N2 - This paper describes the correlation between the elastic modulus, hardness and density of mainly X-ray amorphous TiAlxByNz (0.29 ≤ x ≤ 1.32; 1.15 ≤ y ≤ 2.07; 0.37 ≤ z ≤ 2.19) films, deposited by simultaneous reactive magnetron sputtering from TiAl and TiB2 targets onto AISI 316 stainless steel and Si(100) substrates in Ar/N2 mixtures at 150 °C. The elastic modulus, hardness and density were found to depend on chemical composition and the phases present, and an approximately linear correlation between elastic modulus and hardness could be established. The elastic modulus and hardness were also found to be a function of film density, except in films containing significant amounts of BN.

AB - This paper describes the correlation between the elastic modulus, hardness and density of mainly X-ray amorphous TiAlxByNz (0.29 ≤ x ≤ 1.32; 1.15 ≤ y ≤ 2.07; 0.37 ≤ z ≤ 2.19) films, deposited by simultaneous reactive magnetron sputtering from TiAl and TiB2 targets onto AISI 316 stainless steel and Si(100) substrates in Ar/N2 mixtures at 150 °C. The elastic modulus, hardness and density were found to depend on chemical composition and the phases present, and an approximately linear correlation between elastic modulus and hardness could be established. The elastic modulus and hardness were also found to be a function of film density, except in films containing significant amounts of BN.

KW - Elastic properties

KW - Hardness

KW - Physical vapour deposition (PVD)

KW - Sputtering

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U2 - 10.1016/j.tsf.2006.02.038

DO - 10.1016/j.tsf.2006.02.038

M3 - Article

AN - SCOPUS:33745881068

SN - 0040-6090

VL - 514

SP - 81

EP - 86

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1-2

ER -

Correlation of elastic modulus, hardness and density for sputtered TiAlBN thin films

Abstract

Keywords

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