Crystallographic Texture of MgO and its effect on the growth of BaTiO3 thin films by RF sputtering

L Qiao; X F Bi; S Long; F H Pan; K U Kainer; Y F Han; W Ke; B Liu; X M Zhang; C Q Peng; X Q Zhao; Q Feng; Y F Lu; P X Zhang; C B Jiang

Crystallographic Texture of MgO and its effect on the growth of BaTiO3 thin films by RF sputtering

L Qiao
, X F Bi
, S Long (Editor)
, F H Pan (Editor)
, K U Kainer (Editor)
, Y F Han (Editor)
, W Ke (Editor)
, B Liu (Editor)
, X M Zhang (Editor)
, C Q Peng (Editor)
, X Q Zhao (Editor)
, Q Feng (Editor)
, Y F Lu (Editor)
, P X Zhang (Editor)
, C B Jiang (Editor)

Research output: Chapter in Book/Conference proceeding › Chapter

Abstract

In this work, MgO thin films were prepared by rf magnetron sputtering technique on two different substrates of Si (100) wafers and amorphous glasses. The influence of different deposition conditions such as substrate temperature, Ar pressure, film thicknesses on the crystal structure of MgO thin films were studied. BaTiO3 ferroelectric thin films were subsequently deposited on the MgO films. The XRD results showed that the orientation of MgO films was dependent greatly on the substrate temperature. A highly (100) oriented MgO thin films were obtained at the temperature of 800 degrees C. The crystallographic texture has been deteriorated rapidly as the argon pressure decreased to 1.0 Pa. It has been also found that the film thickness has a great influence on the film orientation. High substrate temperature, high argon pressure and a certain thickness appear to be favorable for formation of a good texture for the MgO films. The structure and microstructure of the BaTiO3 films were various both with deposition conditions and with the crystallographic texture of the MgO. A highly (001) oriented ferroelectric BTO film was obtained on the MgO films with an optimized deposition conditions.

Original language	English
Title of host publication	2006 BIMW: 2006 Beijing International Materials Week, Pts 1-4: MAGNESIUM - ALUMINIUM MATERIALS - AEROSPACE MATERIALS - SUPERCONDUCTING AND FUNCTIONAL MATERIALS
Place of Publication	Stafa-Zurich
Publisher	Trans Tech Publications Ltd
Pages	2175-2178
Number of pages	4
Volume	546-549
ISBN (Print)	0255-5476 978-0-87849-432-3
Publication status	Published - 2007

Publication series

Name	Materials Science Forum
Publisher	Trans Tech Publications Ltd

Keywords

MgO films
BTO films
highly-orientation
RF sputtering
PULSED-LASER DEPOSITION
YTTRIA-STABILIZED-ZIRCONIA
EPITAXIAL-GROWTH
ORIENTATION
MECHANISM
LAYERS

Cite this

Qiao, L., Bi, X. F., Long, S. (Ed.), Pan, F. H. (Ed.), Kainer, K. U. (Ed.), Han, Y. F. (Ed.), Ke, W. (Ed.), Liu, B. (Ed.), Zhang, X. M. (Ed.), Peng, C. Q. (Ed.), Zhao, X. Q. (Ed.), Feng, Q. (Ed.), Lu, Y. F. (Ed.), Zhang, P. X. (Ed.), & Jiang, C. B. (Ed.) (2007). Crystallographic Texture of MgO and its effect on the growth of BaTiO3 thin films by RF sputtering. In 2006 BIMW: 2006 Beijing International Materials Week, Pts 1-4: MAGNESIUM - ALUMINIUM MATERIALS - AEROSPACE MATERIALS - SUPERCONDUCTING AND FUNCTIONAL MATERIALS (Vol. 546-549, pp. 2175-2178). (Materials Science Forum). Trans Tech Publications Ltd.

Qiao, L ; Bi, X F ; Long, S (Editor) et al. / Crystallographic Texture of MgO and its effect on the growth of BaTiO3 thin films by RF sputtering. 2006 BIMW: 2006 Beijing International Materials Week, Pts 1-4: MAGNESIUM - ALUMINIUM MATERIALS - AEROSPACE MATERIALS - SUPERCONDUCTING AND FUNCTIONAL MATERIALS. Vol. 546-549 Stafa-Zurich : Trans Tech Publications Ltd, 2007. pp. 2175-2178 (Materials Science Forum).

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title = "Crystallographic Texture of MgO and its effect on the growth of BaTiO3 thin films by RF sputtering",

abstract = "In this work, MgO thin films were prepared by rf magnetron sputtering technique on two different substrates of Si (100) wafers and amorphous glasses. The influence of different deposition conditions such as substrate temperature, Ar pressure, film thicknesses on the crystal structure of MgO thin films were studied. BaTiO3 ferroelectric thin films were subsequently deposited on the MgO films. The XRD results showed that the orientation of MgO films was dependent greatly on the substrate temperature. A highly (100) oriented MgO thin films were obtained at the temperature of 800 degrees C. The crystallographic texture has been deteriorated rapidly as the argon pressure decreased to 1.0 Pa. It has been also found that the film thickness has a great influence on the film orientation. High substrate temperature, high argon pressure and a certain thickness appear to be favorable for formation of a good texture for the MgO films. The structure and microstructure of the BaTiO3 films were various both with deposition conditions and with the crystallographic texture of the MgO. A highly (001) oriented ferroelectric BTO film was obtained on the MgO films with an optimized deposition conditions.",

keywords = "MgO films, BTO films, highly-orientation, RF sputtering, PULSED-LASER DEPOSITION, YTTRIA-STABILIZED-ZIRCONIA, EPITAXIAL-GROWTH, ORIENTATION, MECHANISM, LAYERS",

author = "L Qiao and Bi, \{X F\} and S Long and Pan, \{F H\} and Kainer, \{K U\} and Han, \{Y F\} and W Ke and B Liu and Zhang, \{X M\} and Peng, \{C Q\} and Zhao, \{X Q\} and Q Feng and Lu, \{Y F\} and Zhang, \{P X\} and Jiang, \{C B\}",

note = "ISI Document Delivery No.: BGD24 Times Cited: 0 Cited Reference Count: 12 Qiao, Liang Bi, Xiaofang Proceedings Paper Beijing International Materials Week JUN 25-30, 2006 Beijing, PEOPLES R CHINA Chinese Mat Res Soc, European Mat Res Soc, Gen Res Inst Nonferrous Metals, Pulead Technol Ind Co Ltd, Shanshan Technol Grp, Chongqing Univ, China Magnesium Ctr, Minist Sci \& Technol China, Natl Dev \& Reform Commiss China, Minist Educ China, Minist Informat Ind China, Natl Nat Sci Fdn China, Chinese Acad Engn, China Assoc Sci \& Technol, Int Union Mat Res Soc LAUBLSRUTISTR 24, CH-8717 STAFA-ZURICH, SWITZERLAND",

year = "2007",

language = "English",

isbn = "0255-5476 978-0-87849-432-3",

volume = "546-549",

series = "Materials Science Forum",

publisher = "Trans Tech Publications Ltd",

pages = "2175--2178",

booktitle = "2006 BIMW: 2006 Beijing International Materials Week, Pts 1-4: MAGNESIUM - ALUMINIUM MATERIALS - AEROSPACE MATERIALS - SUPERCONDUCTING AND FUNCTIONAL MATERIALS",

address = "Switzerland",

}

Qiao, L, Bi, XF, Long, S (ed.), Pan, FH (ed.), Kainer, KU (ed.), Han, YF (ed.), Ke, W (ed.), Liu, B (ed.), Zhang, XM (ed.), Peng, CQ (ed.), Zhao, XQ (ed.), Feng, Q (ed.), Lu, YF (ed.), Zhang, PX (ed.) & Jiang, CB (ed.) 2007, Crystallographic Texture of MgO and its effect on the growth of BaTiO3 thin films by RF sputtering. in 2006 BIMW: 2006 Beijing International Materials Week, Pts 1-4: MAGNESIUM - ALUMINIUM MATERIALS - AEROSPACE MATERIALS - SUPERCONDUCTING AND FUNCTIONAL MATERIALS. vol. 546-549, Materials Science Forum, Trans Tech Publications Ltd, Stafa-Zurich, pp. 2175-2178.

Crystallographic Texture of MgO and its effect on the growth of BaTiO3 thin films by RF sputtering. / Qiao, L; Bi, X F; Long, S (Editor) et al.
2006 BIMW: 2006 Beijing International Materials Week, Pts 1-4: MAGNESIUM - ALUMINIUM MATERIALS - AEROSPACE MATERIALS - SUPERCONDUCTING AND FUNCTIONAL MATERIALS. Vol. 546-549 Stafa-Zurich: Trans Tech Publications Ltd, 2007. p. 2175-2178 (Materials Science Forum).

Research output: Chapter in Book/Conference proceeding › Chapter

TY - CHAP

T1 - Crystallographic Texture of MgO and its effect on the growth of BaTiO3 thin films by RF sputtering

AU - Qiao, L

AU - Bi, X F

A2 - Long, S

A2 - Pan, F H

A2 - Kainer, K U

A2 - Han, Y F

A2 - Ke, W

A2 - Liu, B

A2 - Zhang, X M

A2 - Peng, C Q

A2 - Zhao, X Q

A2 - Feng, Q

A2 - Lu, Y F

A2 - Zhang, P X

A2 - Jiang, C B

N1 - ISI Document Delivery No.: BGD24 Times Cited: 0 Cited Reference Count: 12 Qiao, Liang Bi, Xiaofang Proceedings Paper Beijing International Materials Week JUN 25-30, 2006 Beijing, PEOPLES R CHINA Chinese Mat Res Soc, European Mat Res Soc, Gen Res Inst Nonferrous Metals, Pulead Technol Ind Co Ltd, Shanshan Technol Grp, Chongqing Univ, China Magnesium Ctr, Minist Sci & Technol China, Natl Dev & Reform Commiss China, Minist Educ China, Minist Informat Ind China, Natl Nat Sci Fdn China, Chinese Acad Engn, China Assoc Sci & Technol, Int Union Mat Res Soc LAUBLSRUTISTR 24, CH-8717 STAFA-ZURICH, SWITZERLAND

PY - 2007

Y1 - 2007

N2 - In this work, MgO thin films were prepared by rf magnetron sputtering technique on two different substrates of Si (100) wafers and amorphous glasses. The influence of different deposition conditions such as substrate temperature, Ar pressure, film thicknesses on the crystal structure of MgO thin films were studied. BaTiO3 ferroelectric thin films were subsequently deposited on the MgO films. The XRD results showed that the orientation of MgO films was dependent greatly on the substrate temperature. A highly (100) oriented MgO thin films were obtained at the temperature of 800 degrees C. The crystallographic texture has been deteriorated rapidly as the argon pressure decreased to 1.0 Pa. It has been also found that the film thickness has a great influence on the film orientation. High substrate temperature, high argon pressure and a certain thickness appear to be favorable for formation of a good texture for the MgO films. The structure and microstructure of the BaTiO3 films were various both with deposition conditions and with the crystallographic texture of the MgO. A highly (001) oriented ferroelectric BTO film was obtained on the MgO films with an optimized deposition conditions.

AB - In this work, MgO thin films were prepared by rf magnetron sputtering technique on two different substrates of Si (100) wafers and amorphous glasses. The influence of different deposition conditions such as substrate temperature, Ar pressure, film thicknesses on the crystal structure of MgO thin films were studied. BaTiO3 ferroelectric thin films were subsequently deposited on the MgO films. The XRD results showed that the orientation of MgO films was dependent greatly on the substrate temperature. A highly (100) oriented MgO thin films were obtained at the temperature of 800 degrees C. The crystallographic texture has been deteriorated rapidly as the argon pressure decreased to 1.0 Pa. It has been also found that the film thickness has a great influence on the film orientation. High substrate temperature, high argon pressure and a certain thickness appear to be favorable for formation of a good texture for the MgO films. The structure and microstructure of the BaTiO3 films were various both with deposition conditions and with the crystallographic texture of the MgO. A highly (001) oriented ferroelectric BTO film was obtained on the MgO films with an optimized deposition conditions.

KW - MgO films

KW - BTO films

KW - highly-orientation

KW - RF sputtering

KW - PULSED-LASER DEPOSITION

KW - YTTRIA-STABILIZED-ZIRCONIA

KW - EPITAXIAL-GROWTH

KW - ORIENTATION

KW - MECHANISM

KW - LAYERS

M3 - Chapter

SN - 0255-5476 978-0-87849-432-3

VL - 546-549

T3 - Materials Science Forum

SP - 2175

EP - 2178

BT - 2006 BIMW: 2006 Beijing International Materials Week, Pts 1-4: MAGNESIUM - ALUMINIUM MATERIALS - AEROSPACE MATERIALS - SUPERCONDUCTING AND FUNCTIONAL MATERIALS

PB - Trans Tech Publications Ltd

CY - Stafa-Zurich

ER -

Qiao L, Bi XF, Long S, (ed.), Pan FH, (ed.), Kainer KU, (ed.), Han YF, (ed.) et al. Crystallographic Texture of MgO and its effect on the growth of BaTiO3 thin films by RF sputtering. In 2006 BIMW: 2006 Beijing International Materials Week, Pts 1-4: MAGNESIUM - ALUMINIUM MATERIALS - AEROSPACE MATERIALS - SUPERCONDUCTING AND FUNCTIONAL MATERIALS. Vol. 546-549. Stafa-Zurich: Trans Tech Publications Ltd. 2007. p. 2175-2178. (Materials Science Forum).

Crystallographic Texture of MgO and its effect on the growth of BaTiO3 thin films by RF sputtering

Abstract

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Keywords

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