Deactivation of submelt laser annealed arsenic ultrashallow junctions in silicon during subsequent thermal treatment

Damiano Giubertoni*, Giancarlo Pepponi, Mehmet Alper Sahiner, Stephen P. Kelty, Salvatore Gennaro, Massimo Bersani, Max Kah, Karen J. Kirkby, Roisin Doherty, Majeed A. Foad, F. Meirer, C. Streli, Joseph C. Woicik, Piero Pianetta

*Corresponding author for this work

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