Defect-impurity complexes with high thermal stability in epi-Si n+-p diodes irradiated with MeV electrons

F. P. Korshunov, S. B. Lastovskii, V. P. Markevich, L. I. Murin, Yu V. Bogatyrev, A. R. Peaker

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Defect-impurity complexes with high thermal stability which were generated after high temperature annealing of silicon n+-p diodes irradiated with 4 MeV electrons at 300 K have been studied by means of deep level transient spectroscopy (DLTS). Such defects are of interest because of their possible application in controlling the carrier lifetime in silicon power devices. The parameters of four deep level traps have been determined and compared with the results of photoluminescence studies on thermal stability of electron-irradiation-induced defects. A donor like trap with an energy level at Ev + 0.39 eV was assigned to a complex incorporating an interstitial carbon atom and two oxygen atoms (CiO2i), which gives rise to the P-line (hν = 0.767 eV) in photoluminescence spectra. © 2009 Elsevier Ltd. All rights reserved.
    Original languageEnglish
    Pages (from-to)S131-S133
    JournalVacuum
    Volume83
    Issue number1
    DOIs
    Publication statusPublished - 1 May 2009

    Keywords

    • Carrier lifetime control
    • Deep levels
    • Electron irradiation
    • Epi-silicon
    • n+-p-structures
    • Radiation-induced defects

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