Original language | English |
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Pages (from-to) | 069-080 |
Journal | R & D Management |
Volume | 22 |
Issue number | 1 |
DOIs | |
Publication status | Published - Jan 1992 |
Diffusion Paths in a High-tech Environment: clusters and commonalities
Christopher Easingwood, S O. Lunn
Research output: Contribution to journal › Article › peer-review