Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement

Y. Zhou; M. H. Hong; J. Y H Fuh; L. Lu; B. S. Luk'Yanchuk; Z. B. Wang; L. P. Shi; T. C. Chong

doi:10.1063/1.2163988

Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement

Y. Zhou, M. H. Hong, J. Y H Fuh, L. Lu, B. S. Luk'Yanchuk, Z. B. Wang, L. P. Shi, T. C. Chong

Research output: Contribution to journal › Article › peer-review

Abstract

Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement was demonstrated in this letter. The nanostructure was characterized by field-emission scanning electron microscopy and atomic force microscopy. No cracks were found on the glass surface. The hole size were measured from 200∼300 nm. When laser fluence is close to the damage threshold, a trihole structure was observed. Nonlinear multiphoton absorption and near-field enhancement were the mechanisms of the nanofeature formation. Calculations based on particle-on-surface theory were carried out. The suggested method has potential applications in the nanolithography of a transparent glass substrate for nanostructure device fabrication. © 2006 American Institute of Physics.

Original language	English
Article number	023110
Pages (from-to)	1-3
Number of pages	2
Journal	Applied Physics Letters
Volume	88
Issue number	2
DOIs	https://doi.org/10.1063/1.2163988
Publication status	Published - 2006

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@article{110f95aadfd744e594756ff0c5cab803,

title = "Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement",

abstract = "Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement was demonstrated in this letter. The nanostructure was characterized by field-emission scanning electron microscopy and atomic force microscopy. No cracks were found on the glass surface. The hole size were measured from 200∼300 nm. When laser fluence is close to the damage threshold, a trihole structure was observed. Nonlinear multiphoton absorption and near-field enhancement were the mechanisms of the nanofeature formation. Calculations based on particle-on-surface theory were carried out. The suggested method has potential applications in the nanolithography of a transparent glass substrate for nanostructure device fabrication. {\textcopyright} 2006 American Institute of Physics.",

author = "Y. Zhou and Hong, {M. H.} and Fuh, {J. Y H} and L. Lu and Luk'Yanchuk, {B. S.} and Wang, {Z. B.} and Shi, {L. P.} and Chong, {T. C.}",

year = "2006",

doi = "10.1063/1.2163988",

language = "English",

volume = "88",

pages = "1--3",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

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T1 - Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement

AU - Zhou, Y.

AU - Hong, M. H.

AU - Fuh, J. Y H

AU - Lu, L.

AU - Luk'Yanchuk, B. S.

AU - Wang, Z. B.

AU - Shi, L. P.

AU - Chong, T. C.

PY - 2006

Y1 - 2006

N2 - Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement was demonstrated in this letter. The nanostructure was characterized by field-emission scanning electron microscopy and atomic force microscopy. No cracks were found on the glass surface. The hole size were measured from 200∼300 nm. When laser fluence is close to the damage threshold, a trihole structure was observed. Nonlinear multiphoton absorption and near-field enhancement were the mechanisms of the nanofeature formation. Calculations based on particle-on-surface theory were carried out. The suggested method has potential applications in the nanolithography of a transparent glass substrate for nanostructure device fabrication. © 2006 American Institute of Physics.

AB - Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement was demonstrated in this letter. The nanostructure was characterized by field-emission scanning electron microscopy and atomic force microscopy. No cracks were found on the glass surface. The hole size were measured from 200∼300 nm. When laser fluence is close to the damage threshold, a trihole structure was observed. Nonlinear multiphoton absorption and near-field enhancement were the mechanisms of the nanofeature formation. Calculations based on particle-on-surface theory were carried out. The suggested method has potential applications in the nanolithography of a transparent glass substrate for nanostructure device fabrication. © 2006 American Institute of Physics.

U2 - 10.1063/1.2163988

DO - 10.1063/1.2163988

M3 - Article

SN - 0003-6951

VL - 88

SP - 1

EP - 3

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 2

M1 - 023110

ER -

Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement

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