Abstract
The presence of active sites in metal-organic framework (MOF) materials can control and affect significantly their performance in adsorption and catalysis. However, revealing the interactions between substrate and active sites in MOFs with atomic precision remains a challenging task. Here, we report the direct observation of binding of NH3 in a series of UiO-66 materials containing atomically-dispersed defects and open Cu(I) and Cu(II) sites. While all MOFs in this series exhibit similar surface areas (1111-1135 m2 g−1), decoration of the −OH site in UiO-66-defect with Cu(II) results in a 43% enhancement of the isothermal uptake of NH3 at 273 K and 1.0 bar from 11.8 in UiO-66-defect to 16.9 mmol g−1 in UiO-66-CuII. A 100% enhancement of dynamic adsorption of NH3 at a concentration level of 630 ppm from 2.07 mmol g−1 in UiO-66-defect to 4.15 mmol g−1 in UiO-66-CuII at 298 K is observed. In situ neutron powder diffraction, inelastic neutron scattering, and electron paramagnetic resonance, solid-state nuclear magnetic resonance and infrared spectroscopies, coupled with modelling reveal that the enhanced NH3 uptake in UiO-66-CuII originates from {Cu(II)⋯NH3} interaction, with a reversible change in geometry at Cu(II) from near-linear to trigonal coordination. This work represents the first example of structural elucidation of NH3 binding in MOFs containing open metal sites, and will inform the design of new efficient MOF sorbents by targeted control of active sites for NH3 capture and storage.
Original language | English |
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Pages (from-to) | 8624–8632 |
Number of pages | 9 |
Journal | American Chemical Society. Journal |
Volume | 144 |
Issue number | 19 |
Early online date | 9 May 2022 |
DOIs | |
Publication status | Published - 18 May 2022 |
Research Beacons, Institutes and Platforms
- Photon Science Institute
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EPSRC National Research Facility for Electron Paramagnetic Resonance
Collison, D. (Academic lead), Mcinnes, E. (Academic lead), Tuna, F. (Academic lead), Bowen, A. (Academic lead), Shanmugam, M. (Senior Technical Specialist), Brookfield, A. (Technical Specialist), Fleming, E. (Other) & Cliff, M. (Platform Lead)
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