Direct observation of Ni3+ and Ni2+ in correlated LaNiO3-delta films

L Qiao; X F Bi

doi:57002 10.1209/0295-5075/93/57002

Direct observation of Ni3+ and Ni2+ in correlated LaNiO3-delta films

L Qiao, X F Bi

Research output: Contribution to journal › Article › peer-review

Abstract

The X-ray photoelectron spectroscopic deconvolution analysis is applied to quantitatively distinguish valence states of Ni and to obtain the delta value in LaNiO3-delta films on Si substrates. The mechanism of the Ni3+/Ni2+ ratio dependent transport is clarified by the combination of transport measurements and first-principle calculations. At lower Ni3+/Ni2+ ratio of 0.39, the LaNiO2.64 film exhibits semi-conductive behavior with carriers mainly being hopping polarons, while higher Ni3+/Ni2+ ratio transfers the LaNiO2.84 film to an electronic conductor. The observed reduction of the electron-phonon interaction, shortened mean free path, and increased electron-electron coupling are suggested to be correlated to high Ni3+/Ni2+ ratio. Copyright (c) EPLA, 2011

Original language	English
Journal	EPL
Volume	93
Issue number	5
DOIs	https://doi.org/57002 10.1209/0295-5075/93/57002
Publication status	Published - 2011

Keywords

TRANSPORT-PROPERTIES
THIN-FILMS
RNIO3 R
PEROVSKITES
TEMPERATURE
RESISTIVITY
DEPOSITION
CONDUCTION
SUBSTRATE
STATE

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57002 10.1209/0295-5075/93/57002

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@article{31e8de47bfb34de6958cfa2c3471ab1b,

title = "Direct observation of Ni3+ and Ni2+ in correlated LaNiO3-delta films",

abstract = "The X-ray photoelectron spectroscopic deconvolution analysis is applied to quantitatively distinguish valence states of Ni and to obtain the delta value in LaNiO3-delta films on Si substrates. The mechanism of the Ni3+/Ni2+ ratio dependent transport is clarified by the combination of transport measurements and first-principle calculations. At lower Ni3+/Ni2+ ratio of 0.39, the LaNiO2.64 film exhibits semi-conductive behavior with carriers mainly being hopping polarons, while higher Ni3+/Ni2+ ratio transfers the LaNiO2.84 film to an electronic conductor. The observed reduction of the electron-phonon interaction, shortened mean free path, and increased electron-electron coupling are suggested to be correlated to high Ni3+/Ni2+ ratio. Copyright (c) EPLA, 2011",

keywords = "TRANSPORT-PROPERTIES, THIN-FILMS, RNIO3 R, PEROVSKITES, TEMPERATURE, RESISTIVITY, DEPOSITION, CONDUCTION, SUBSTRATE, STATE",

author = "L Qiao and Bi, {X F}",

note = "ISI Document Delivery No.: 734GP Times Cited: 2 Cited Reference Count: 34 Qiao, Liang Bi, Xiaofang EPL ASSOCIATION, EUROPEAN PHYSICAL SOCIETY",

year = "2011",

doi = "57002 10.1209/0295-5075/93/57002",

language = "English",

volume = "93",

journal = "EPL",

issn = "0295-5075",

publisher = "IOP Publishing Ltd",

number = "5",

}

TY - JOUR

T1 - Direct observation of Ni3+ and Ni2+ in correlated LaNiO3-delta films

AU - Qiao, L

AU - Bi, X F

N1 - ISI Document Delivery No.: 734GP Times Cited: 2 Cited Reference Count: 34 Qiao, Liang Bi, Xiaofang EPL ASSOCIATION, EUROPEAN PHYSICAL SOCIETY

PY - 2011

Y1 - 2011

N2 - The X-ray photoelectron spectroscopic deconvolution analysis is applied to quantitatively distinguish valence states of Ni and to obtain the delta value in LaNiO3-delta films on Si substrates. The mechanism of the Ni3+/Ni2+ ratio dependent transport is clarified by the combination of transport measurements and first-principle calculations. At lower Ni3+/Ni2+ ratio of 0.39, the LaNiO2.64 film exhibits semi-conductive behavior with carriers mainly being hopping polarons, while higher Ni3+/Ni2+ ratio transfers the LaNiO2.84 film to an electronic conductor. The observed reduction of the electron-phonon interaction, shortened mean free path, and increased electron-electron coupling are suggested to be correlated to high Ni3+/Ni2+ ratio. Copyright (c) EPLA, 2011

AB - The X-ray photoelectron spectroscopic deconvolution analysis is applied to quantitatively distinguish valence states of Ni and to obtain the delta value in LaNiO3-delta films on Si substrates. The mechanism of the Ni3+/Ni2+ ratio dependent transport is clarified by the combination of transport measurements and first-principle calculations. At lower Ni3+/Ni2+ ratio of 0.39, the LaNiO2.64 film exhibits semi-conductive behavior with carriers mainly being hopping polarons, while higher Ni3+/Ni2+ ratio transfers the LaNiO2.84 film to an electronic conductor. The observed reduction of the electron-phonon interaction, shortened mean free path, and increased electron-electron coupling are suggested to be correlated to high Ni3+/Ni2+ ratio. Copyright (c) EPLA, 2011

KW - TRANSPORT-PROPERTIES

KW - THIN-FILMS

KW - RNIO3 R

KW - PEROVSKITES

KW - TEMPERATURE

KW - RESISTIVITY

KW - DEPOSITION

KW - CONDUCTION

KW - SUBSTRATE

KW - STATE

U2 - 57002 10.1209/0295-5075/93/57002

DO - 57002 10.1209/0295-5075/93/57002

M3 - Article

SN - 0295-5075

VL - 93

JO - EPL

JF - EPL

IS - 5

ER -

Direct observation of Ni3+ and Ni2+ in correlated LaNiO3-delta films

Abstract

Keywords

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