Abstract
The spatial distributions of deep electron levels in the GaAs layers of GaAs-AlxGa1-xAs heterostructures grown by MOCVD have been measured. Deep states frequently observed in MOCVD AlxGa1-xAs, but not normally found in MOCVD GaAs, were detected. The distributions of these deep levels indicate that their incorporation is related to the contamination of the reactor during the growth of AlxGa1-xAs. The role of vacancies in this process is also discussed.
Original language | English |
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Pages (from-to) | 295-300 |
Number of pages | 6 |
Journal | Journal of Crystal Growth |
Volume | 68 |
Issue number | 1 |
DOIs | |
Publication status | Published - 1 Sept 1984 |