Donor level of interstitial hydrogen in GaAs

L. Dobaczewski*, K. Bonde Nielsen, A. Nylandsted Larsen, A. R. Peaker

*Corresponding author for this work

    Research output: Contribution to journalConference articlepeer-review

    Abstract

    The first data evidencing the existence of the donor level of the interstitial hydrogen in GaAs are presented. The abundant formation of the (0/+) donor level after in situ low-temperature implantation of hydrogen into the depletion layer of GaAs Schottky diodes has been observed and the activation energy and annealing properties have been determined by Laplace DLTS. The activation energy for electron emission of this donor state is 0.14 eV. Above 100 K the hydrogen deep donor state is unstable, converting to a more stable form when there are electrons available for the capture process. A slightly perturbed form of the hydrogen donor in its neutral charge state can be recovered by illuminating the sample. This process releases twice as many electrons as the ionisation process of the hydrogen donor state itself. This fact, by analogy with the silicon case, evidences the negative-U behaviour of hydrogen in GaAs.
    Original languageEnglish
    Pages (from-to)614-617
    Number of pages4
    JournalPhysica B: Condensed Matter
    Volume376-377
    DOIs
    Publication statusPublished - 1 Apr 2006
    EventProceedings of the 23rd International Conference on Defects in Semiconductors -
    Duration: 24 Jul 200529 Jul 2005

    Keywords

    • Hydrogen in GaAs
    • Laplace DLTS
    • Universal level alignment

    Research Beacons, Institutes and Platforms

    • Photon Science Institute

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