Dynamic models relating processing parameters and melt track width during laser marking of clay tiles

A. A. Peligrad; E. Zhou; D. Morton; L. Li

doi:10.1016/S0030-3992(01)00100-1

Dynamic models relating processing parameters and melt track width during laser marking of clay tiles

A. A. Peligrad, E. Zhou, D. Morton, L. Li

Mechanical and Aerospace Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

This paper describes two dynamic models relating processing parameters and melt pool width during laser marking/engraving of clay tiles using a high-power diode laser. The models were determined by process identification techniques and were validated with a PI algorithm. The output variable considered for the laser clay tile marking process was melt pool width, measured by using a fast CCD recording system and analysed with an image-processing software. The input quantities investigated were laser power and traverse speed. Reasonable agreements between the measured data and the model outputs were achieved. Errors less than 1.3 μm of the melt pool width for the operating points were found. On the basis of these models a simple PI-controller was designed and tuned to guarantee zero steady-state error in case of an absorptivity disturbance. © 2002 Elsevier Science Ltd. All rights reserved.

Original language	English
Pages (from-to)	115-123
Number of pages	8
Journal	Optics and Laser Technology
Volume	34
Issue number	2
DOIs	https://doi.org/10.1016/S0030-3992(01)00100-1
Publication status	Published - Mar 2002

Keywords

Clay tiles
Dynamic models
Laser marking
Melt pool track
Process identification
Transfer function

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10.1016/S0030-3992(01)00100-1

LPRC: Laser Processing Research Centre Impact
Allegre, O. (PI), Crosby, D. (PI), Domingos, M. (PI), Francis, J. (PI), Gillen, D. (PI), Guo, W. (PI), Li, L. (PI), Mativenga, P. (PI), Rogers, B. D. (PI), Whitehead, D. (PI), Wilson, D. (PI), Zhong, S. (PI), Mirhosseini, N. (Researcher), Ouyang, J. (Researcher), Huang, Y. (Researcher), Wei, C. (Researcher), Cheng, D. (PGR student), Suryo Pratomo, E. (PGR student), Zhang, Z. (PGR student), Li, Z. (PGR student), Mo, H. (PGR student), Zhu, M. (PGR student), Li, Q. (PGR student), Liu, W. (PGR student), Wang, L. (PGR student), Guo, H. (PGR student), Heinemann, R. (PI) & Liu, Z. (PI)
1/04/00 → …
Project: Research

Cite this

@article{e7b409698cf74975be354d0569dab6ee,

title = "Dynamic models relating processing parameters and melt track width during laser marking of clay tiles",

abstract = "This paper describes two dynamic models relating processing parameters and melt pool width during laser marking/engraving of clay tiles using a high-power diode laser. The models were determined by process identification techniques and were validated with a PI algorithm. The output variable considered for the laser clay tile marking process was melt pool width, measured by using a fast CCD recording system and analysed with an image-processing software. The input quantities investigated were laser power and traverse speed. Reasonable agreements between the measured data and the model outputs were achieved. Errors less than 1.3 μm of the melt pool width for the operating points were found. On the basis of these models a simple PI-controller was designed and tuned to guarantee zero steady-state error in case of an absorptivity disturbance. {\textcopyright} 2002 Elsevier Science Ltd. All rights reserved.",

keywords = "Clay tiles, Dynamic models, Laser marking, Melt pool track, Process identification, Transfer function",

author = "Peligrad, {A. A.} and E. Zhou and D. Morton and L. Li",

year = "2002",

month = mar,

doi = "10.1016/S0030-3992(01)00100-1",

language = "English",

volume = "34",

pages = "115--123",

journal = "Optics and Laser Technology",

issn = "0030-3992",

publisher = "Elsevier BV",

number = "2",

}

TY - JOUR

T1 - Dynamic models relating processing parameters and melt track width during laser marking of clay tiles

AU - Peligrad, A. A.

AU - Zhou, E.

AU - Morton, D.

AU - Li, L.

PY - 2002/3

Y1 - 2002/3

N2 - This paper describes two dynamic models relating processing parameters and melt pool width during laser marking/engraving of clay tiles using a high-power diode laser. The models were determined by process identification techniques and were validated with a PI algorithm. The output variable considered for the laser clay tile marking process was melt pool width, measured by using a fast CCD recording system and analysed with an image-processing software. The input quantities investigated were laser power and traverse speed. Reasonable agreements between the measured data and the model outputs were achieved. Errors less than 1.3 μm of the melt pool width for the operating points were found. On the basis of these models a simple PI-controller was designed and tuned to guarantee zero steady-state error in case of an absorptivity disturbance. © 2002 Elsevier Science Ltd. All rights reserved.

AB - This paper describes two dynamic models relating processing parameters and melt pool width during laser marking/engraving of clay tiles using a high-power diode laser. The models were determined by process identification techniques and were validated with a PI algorithm. The output variable considered for the laser clay tile marking process was melt pool width, measured by using a fast CCD recording system and analysed with an image-processing software. The input quantities investigated were laser power and traverse speed. Reasonable agreements between the measured data and the model outputs were achieved. Errors less than 1.3 μm of the melt pool width for the operating points were found. On the basis of these models a simple PI-controller was designed and tuned to guarantee zero steady-state error in case of an absorptivity disturbance. © 2002 Elsevier Science Ltd. All rights reserved.

KW - Clay tiles

KW - Dynamic models

KW - Laser marking

KW - Melt pool track

KW - Process identification

KW - Transfer function

U2 - 10.1016/S0030-3992(01)00100-1

DO - 10.1016/S0030-3992(01)00100-1

M3 - Article

SN - 0030-3992

VL - 34

SP - 115

EP - 123

JO - Optics and Laser Technology

JF - Optics and Laser Technology

IS - 2

ER -

Dynamic models relating processing parameters and melt track width during laser marking of clay tiles

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Keywords

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LPRC: Laser Processing Research Centre Impact

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