Effect of fluorine implantation dose on boron thermal diffusion in silicon

H. A W El Mubarek, J. M. Bonar, G. D. Dilliway, P. Ashburn, M. Karunaratne, A. F. Willoughby, Y. Wang, P. L F Hemment, R. Price, J. Zhang, P. Ward

    Research output: Contribution to journalArticlepeer-review

    Fingerprint

    Dive into the research topics of 'Effect of fluorine implantation dose on boron thermal diffusion in silicon'. Together they form a unique fingerprint.

    Chemistry

    Material Science

    Biochemistry, Genetics and Molecular Biology