TY - GEN
T1 - Effect of Ion Types on Arc Erosion of Circuit Breaker Contact
T2 - 18th Annual Conference of China Electrotechnical Society, ACCES 2023
AU - Wang, Xin
AU - Matharage, Shanika Yasantha
AU - Xu, Ruoyu
AU - Zhou, Mingyu
AU - Zhou, Yuzhen
AU - Ding, Yi
AU - Wang, Zhongdong
N1 - Publisher Copyright:
© Beijing Paike Culture Commu. Co., Ltd. 2024.
PY - 2024/3/11
Y1 - 2024/3/11
N2 - SF6 circuit breakers are commonly used as switchgear devices in high-voltage power systems. During arcing process, the particles in arc plasma are mostly positive ions (metal ions, S ions, and F ions) and electrons at temperatures beyond 15000 K. Arc erosion on the cathode surface is dominantly determined by positive ion bombardment. Thus, studying the effect of ion type and energy on arc erosion of different contacts is helpful for understanding the failure mechanisms. The current research undertakes an investigation into the impacts of Cu, S, and F ions, all with a constant energy of 50 eV, on both Cu and graphene-covered Cu substrates. Utilising molecular dynamics (MD) simulation, results reveal that S ions induce more substantial damage to the Cu substrate than Cu and F ions. Cu ions have a high sticking probability to the Cu surface, and the larger size and heavier weight of S ions mean more damage than F ions with the same incident ion energy. Moreover, graphene on the surface significantly mitigates the damage caused by all three ion types, as graphene aids in energy dissipation by oscillating waves, thereby reducing the energy acting on the underlying Cu. This research provides insights into the interaction between different plasma ions and contact materials, contributing to the improvement of contact materials.
AB - SF6 circuit breakers are commonly used as switchgear devices in high-voltage power systems. During arcing process, the particles in arc plasma are mostly positive ions (metal ions, S ions, and F ions) and electrons at temperatures beyond 15000 K. Arc erosion on the cathode surface is dominantly determined by positive ion bombardment. Thus, studying the effect of ion type and energy on arc erosion of different contacts is helpful for understanding the failure mechanisms. The current research undertakes an investigation into the impacts of Cu, S, and F ions, all with a constant energy of 50 eV, on both Cu and graphene-covered Cu substrates. Utilising molecular dynamics (MD) simulation, results reveal that S ions induce more substantial damage to the Cu substrate than Cu and F ions. Cu ions have a high sticking probability to the Cu surface, and the larger size and heavier weight of S ions mean more damage than F ions with the same incident ion energy. Moreover, graphene on the surface significantly mitigates the damage caused by all three ion types, as graphene aids in energy dissipation by oscillating waves, thereby reducing the energy acting on the underlying Cu. This research provides insights into the interaction between different plasma ions and contact materials, contributing to the improvement of contact materials.
KW - Arc plasma
KW - Ion bombardment
KW - Molecular dynamics simulation
KW - SF6 circuit breaker
UR - http://www.scopus.com/inward/record.url?scp=85188676097&partnerID=8YFLogxK
U2 - 10.1007/978-981-97-1072-0_13
DO - 10.1007/978-981-97-1072-0_13
M3 - Conference contribution
AN - SCOPUS:85188676097
SN - 9789819710713
T3 - Lecture Notes in Electrical Engineering
SP - 131
EP - 138
BT - The proceedings of the 18th Annual Conference of China Electrotechnical Society - Volume VII
A2 - Yang, Qingxin
A2 - Li, Zewen
A2 - Luo, An
PB - Springer Nature
Y2 - 15 September 2023 through 17 September 2023
ER -