Electron-beam-induced direct etching of graphene

Cornelius Thiele; Alexandre Felten; Tim J. Echtermeyer; Andrea C. Ferrari; Cinzia Casiraghi; Hilbert V. Löhneysen; Ralph Krupke

doi:10.1016/j.carbon.2013.07.038

Electron-beam-induced direct etching of graphene

Cornelius Thiele, Alexandre Felten, Tim J. Echtermeyer, Andrea C. Ferrari, Cinzia Casiraghi, Hilbert V. Löhneysen, Ralph Krupke

Research output: Contribution to journal › Article › peer-review

Abstract

We present electron-beam-induced oxidation of single- and bilayer graphene devices in a low-voltage scanning electron microscope. We show that the injection of oxygen leads to targeted etching at the focal point, enabling us to pattern graphene with a resolution of better than 20 nm. Voltage-contrast imaging, in conjunction with finite-element simulations, explain the secondary-electron intensities and correlate them to the etch profile. © 2013 Elsevier Ltd. All rights reserved.

Original language	English
Pages (from-to)	84-91
Number of pages	7
Journal	Carbon
Volume	64
DOIs	https://doi.org/10.1016/j.carbon.2013.07.038
Publication status	Published - Nov 2013

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10.1016/j.carbon.2013.07.038

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title = "Electron-beam-induced direct etching of graphene",

abstract = "We present electron-beam-induced oxidation of single- and bilayer graphene devices in a low-voltage scanning electron microscope. We show that the injection of oxygen leads to targeted etching at the focal point, enabling us to pattern graphene with a resolution of better than 20 nm. Voltage-contrast imaging, in conjunction with finite-element simulations, explain the secondary-electron intensities and correlate them to the etch profile. {\textcopyright} 2013 Elsevier Ltd. All rights reserved.",

author = "Cornelius Thiele and Alexandre Felten and Echtermeyer, \{Tim J.\} and Ferrari, \{Andrea C.\} and Cinzia Casiraghi and \{V. L{\"o}hneysen\}, Hilbert and Ralph Krupke",

year = "2013",

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AU - Thiele, Cornelius

AU - Felten, Alexandre

AU - Echtermeyer, Tim J.

AU - Ferrari, Andrea C.

AU - Casiraghi, Cinzia

AU - V. Löhneysen, Hilbert

AU - Krupke, Ralph

PY - 2013/11

Y1 - 2013/11

N2 - We present electron-beam-induced oxidation of single- and bilayer graphene devices in a low-voltage scanning electron microscope. We show that the injection of oxygen leads to targeted etching at the focal point, enabling us to pattern graphene with a resolution of better than 20 nm. Voltage-contrast imaging, in conjunction with finite-element simulations, explain the secondary-electron intensities and correlate them to the etch profile. © 2013 Elsevier Ltd. All rights reserved.

AB - We present electron-beam-induced oxidation of single- and bilayer graphene devices in a low-voltage scanning electron microscope. We show that the injection of oxygen leads to targeted etching at the focal point, enabling us to pattern graphene with a resolution of better than 20 nm. Voltage-contrast imaging, in conjunction with finite-element simulations, explain the secondary-electron intensities and correlate them to the etch profile. © 2013 Elsevier Ltd. All rights reserved.

UR - https://www.scopus.com/pages/publications/84883598286

U2 - 10.1016/j.carbon.2013.07.038

DO - 10.1016/j.carbon.2013.07.038

M3 - Article

SN - 0008-6223

VL - 64

SP - 84

EP - 91

JO - Carbon

JF - Carbon

ER -

Electron-beam-induced direct etching of graphene

Abstract

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