Abstract
ArF laser ablation of Ti:sapphire (Ti:Al2O3) has been investigated as a potential means for micromachining this laser crystal and depositing thin layers for use as active waveguides. Plume spectra recorded for ablation in low pressure oxygen and a preliminary assessment of layers grown by this method are reported.
| Original language | English |
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| Pages (from-to) | 849-854 |
| Number of pages | 6 |
| Journal | Applied Surface Science |
| Volume | 96-98 |
| Publication status | Published - Apr 1996 |