Extending the operational limit of a cooled spatial light modulator exposed o 200 W average power for holographic picosecond laser materials processing

Yue Tang, Qianliang Li, Fang Zheng, Olivier Allegre, Walter Perrie, Guangyu Zhu, David Whitehead, Joerg Schille, Udo Loeschner, Dun Liu, Lin Li, Stuart Edwardson, Geoff Dearden

Research output: Contribution to journalArticlepeer-review

Abstract

The phase range of a Spatial Light Modulator (SLM) requires full 2π response for accurate phase modulation of the incident laser wavefront to create the desired structured intensity distribution. While cooled SLM’s allow increased power exposures, degradation in performance occurs with average powers P>100 W in a Gaussian beam due to residual absorption and consequent heating of the liquid crystal (LC) layer which seriously limits the phase stroke and diffraction efficiency. By introducing a refractive flat top intensity generator ahead of a cooled SLM, we have extended the phase range to Δφ =2π at incident power P=210 W with only a small light field depolarisation. The operational limit has therefore been extended significantly, allowing efficient, parallel laser materials processing with a high-power picosecond laser. The calculation and implementation of binary Damman gratings for multi-beam laser processing is also shown to be useful at high power exposure.
Original languageEnglish
Article number111589
JournalOptics & Laser Technology
Volume181
Issue numberA
Early online date23 Aug 2024
DOIs
Publication statusPublished - 1 Feb 2025

Keywords

  • Spatial light modulator
  • Picosecond Laser
  • Multi-beam processing
  • material processing

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