Fuzzy tungsten in a magnetron sputtering device

T. J. Petty, Aneeqa Khan, T. Heil, J. W. Bradley

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    Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 1023–3.0 × 1024 m−2, the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 1024 m−2, and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ1/2 relation as opposed to the incubation fluence fit.

    Original languageEnglish
    Pages (from-to)374-385
    Number of pages12
    JournalJournal of Nuclear Materials
    Early online date18 Aug 2016
    Publication statusPublished - 1 Nov 2016


    • Fuzzy tungsten
    • Helium
    • Magnetron


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