Generation of surface plasmon resonance for sub-wavelength nano-photolithography

Scott Lewis, Lucio Piccirillo

    Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

    Abstract

    A novel photolithographic technique using a periodic hexagonal close packed silver nanoparticle 2D array photo mask has been demonstrated to transfer a nano-pattern into a photoresist using I line proximity photolithography. A 30 nm hexagonal close packed silver nanoparticle 2D array pattern with a 50 nm period has been successfully transferred into S1813 photoresist using I-line exposure wavelength. The resultant feature sizes were 34 nm with a period of 46 nm, due to the surface plasmon resonance where the S1813 photoresist feature is approximately 11 times smaller than I-line exposure wavelength.

    Original languageEnglish
    Title of host publicationPlasmons
    Subtitle of host publicationStructure, Properties and Applications
    PublisherNova Science Publishers
    Pages99-116
    Number of pages18
    ISBN (Print)9781621000600
    Publication statusPublished - Mar 2013

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