Abstract
A novel photolithographic technique using a periodic hexagonal close packed silver nanoparticle 2D array photo mask has been demonstrated to transfer a nano-pattern into a photoresist using I line proximity photolithography. A 30 nm hexagonal close packed silver nanoparticle 2D array pattern with a 50 nm period has been successfully transferred into S1813 photoresist using I-line exposure wavelength. The resultant feature sizes were 34 nm with a period of 46 nm, due to the surface plasmon resonance where the S1813 photoresist feature is approximately 11 times smaller than I-line exposure wavelength.
Original language | English |
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Title of host publication | Plasmons |
Subtitle of host publication | Structure, Properties and Applications |
Publisher | Nova Science Publishers |
Pages | 99-116 |
Number of pages | 18 |
ISBN (Print) | 9781621000600 |
Publication status | Published - Mar 2013 |