Gold-hydrogen complexes in silicon

L. Rubaldo*, P. Deixler, I. D. Hawkins, J. Terry, O. K. Maude, J. C. Portal, J. H. Evans-Freeman, L. Dobaczewski, A. R. Peaker

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

Electron emission from gold and gold-hydrogen complexes in n-type silicon have been studied using high resolution (Laplace) DLTS. This technique permits a clear separation of defects which have very similar carrier emission characteristics. At low hydrogen concentrations our results confirm those inferred previously from conventional DLTS. However by using `Laplace' DLTS it has been possible to study the gold acceptor and G4 defect independently. G4 has an activation energy of 542±8 meV. By directly measuring the electron capture cross-section of G4 we conclude that it is acceptor like. At high hydrogen concentrations additional complexes are formed, notably a defect with emission characteristics similar to G4 (referred to as G4′) with an activation energy of 578±10 meV, and a state with an activation energy for electron emission of 276 5 meV. We put forward the hypothesis that these may be charge states of AuH2 or AuH3 complexes.

Original languageEnglish
Pages (from-to)126-129
Number of pages4
JournalMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
Volume58
Issue number1-2
DOIs
Publication statusPublished - 12 Feb 1999

Keywords

  • Transition metal impurities
  • Hydrogen
  • Silicon
  • Complexes
  • DLTS

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