High-energy ion-implantation of a moderately deep acceptor Hg into liquid encapsulated Czochralski grown GaAs: formation of new shallow emission bands

K. Harada, Y. Makita, H. Shibata, B. Lo, A. C. Beye, M. P. Halsall, S. Kimura, N. Kobayashi, T. Iida, T. Shima, A. Obara

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Hg (mercury) in GaAs is known to be a moderately deep acceptor impurity, having a 52 meV activation energy. Optical properties of Hg acceptors in GaAs were systematically investigated as a function of Hg concentration, [Hg]. Samples were prepared by high-energy ion-implantation of Hg+ into GaAs grown by the liquid encapsulated Czochralski (LEC) method. Heat treatment was made by furnace annealing and rapid thermal annealing. Photoluminescence measurements at 2K revealed that the Hg-related so-called 'g' line is formed in addition to the well-defined conduction band-to-Hg acceptor transition, (e, Hg). Additionally, three shallow emissions are formed for net hole concentrations |NA-ND| greater than 2×1017 cm-3. This is the first demonstration that even Hg in GaAs makes multiple shallow emissions due to acceptor-acceptor pairs and LEC GaAs can be used for the investigations of these emissions.
    Original languageEnglish
    Pages (from-to)835-840
    Number of pages5
    JournalMaterials Research Society Symposium Proceedings
    Volume396
    Publication statusPublished - 1996

    Fingerprint

    Dive into the research topics of 'High-energy ion-implantation of a moderately deep acceptor Hg into liquid encapsulated Czochralski grown GaAs: formation of new shallow emission bands'. Together they form a unique fingerprint.

    Cite this